Behaviour of aluminum in ozonated water, optical and electrochemical study

Heini Ritala; Antero Pehkonen; Kimmo Solehmainen; Leif Grönberg

Behaviour of aluminum in ozonated water, optical and electrochemical study

Heini Ritala
, Antero Pehkonen
, Kimmo Solehmainen
, Leif Grönberg

Helsinki University of Technology

Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review

Original language	English
Title of host publication	Cleaning Technology in Semiconductor Device Manufacturing VIII
Subtitle of host publication	Proceedings of the International Symposium
Editors	J. Ruzyllo, T. Hattori, R. L. Opila, R. E. Novak
Publisher	Electrochemical Society ECS
Pages	405-412
ISBN (Print)	1-56677-411-X
Publication status	Published - 2004
MoE publication type	A4 Article in a conference publication
Event	8th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing: Part of the 204th ECS Meeting - Orlando, United States Duration: 12 Oct 2003 → 16 Oct 2003

Publication series

Series	ECS Proceedings Volumes
Volume	2003-26
ISSN	2576-1579

Conference

Conference	8th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
Country/Territory	United States
City	Orlando
Period	12/10/03 → 16/10/03

Cite this

Ritala, Heini ; Pehkonen, Antero ; Solehmainen, Kimmo et al. / Behaviour of aluminum in ozonated water, optical and electrochemical study. Cleaning Technology in Semiconductor Device Manufacturing VIII: Proceedings of the International Symposium. editor / J. Ruzyllo ; T. Hattori ; R. L. Opila ; R. E. Novak. Electrochemical Society ECS, 2004. pp. 405-412 (ECS Proceedings Volumes, Vol. 2003-26).

@inproceedings{e31d7b2757d94aff95b5b43d5329a684,

title = "Behaviour of aluminum in ozonated water, optical and electrochemical study",

author = "Heini Ritala and Antero Pehkonen and Kimmo Solehmainen and Leif Gr{\"o}nberg",

note = "PNA: Saloniemi; 8th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing : Part of the 204th ECS Meeting ; Conference date: 12-10-2003 Through 16-10-2003",

year = "2004",

language = "English",

isbn = "1-56677-411-X",

series = "ECS Proceedings Volumes",

publisher = "Electrochemical Society ECS",

pages = "405--412",

editor = "J. Ruzyllo and T. Hattori and Opila, \{R. L.\} and Novak, \{R. E.\}",

booktitle = "Cleaning Technology in Semiconductor Device Manufacturing VIII",

address = "United States",

}

Ritala, H, Pehkonen, A, Solehmainen, K & Grönberg, L 2004, Behaviour of aluminum in ozonated water, optical and electrochemical study. in J Ruzyllo, T Hattori, RL Opila & RE Novak (eds), Cleaning Technology in Semiconductor Device Manufacturing VIII: Proceedings of the International Symposium. Electrochemical Society ECS, ECS Proceedings Volumes, vol. 2003-26, pp. 405-412, 8th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, Orlando, Florida, United States, 12/10/03.

Behaviour of aluminum in ozonated water, optical and electrochemical study. / Ritala, Heini; Pehkonen, Antero; Solehmainen, Kimmo et al.
Cleaning Technology in Semiconductor Device Manufacturing VIII: Proceedings of the International Symposium. ed. / J. Ruzyllo; T. Hattori; R. L. Opila; R. E. Novak. Electrochemical Society ECS, 2004. p. 405-412 (ECS Proceedings Volumes, Vol. 2003-26).

Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review

TY - GEN

T1 - Behaviour of aluminum in ozonated water, optical and electrochemical study

AU - Ritala, Heini

AU - Pehkonen, Antero

AU - Solehmainen, Kimmo

AU - Grönberg, Leif

N1 - PNA: Saloniemi

PY - 2004

Y1 - 2004

M3 - Conference article in proceedings

SN - 1-56677-411-X

T3 - ECS Proceedings Volumes

SP - 405

EP - 412

BT - Cleaning Technology in Semiconductor Device Manufacturing VIII

A2 - Ruzyllo, J.

A2 - Hattori, T.

A2 - Opila, R. L.

A2 - Novak, R. E.

PB - Electrochemical Society ECS

T2 - 8th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing

Y2 - 12 October 2003 through 16 October 2003

ER -

Ritala H, Pehkonen A, Solehmainen K, Grönberg L. Behaviour of aluminum in ozonated water, optical and electrochemical study. In Ruzyllo J, Hattori T, Opila RL, Novak RE, editors, Cleaning Technology in Semiconductor Device Manufacturing VIII: Proceedings of the International Symposium. Electrochemical Society ECS. 2004. p. 405-412. (ECS Proceedings Volumes, Vol. 2003-26).