Benzoylpivaloylmethanide precursors for the chemical beam epitaxy of oxide thin films: 1. Synthesis, characterization, and use of yttrium benzoylpivaloylmethanide

E. Fritsch, E. Mächler, F. Arrouy, Olli Orama, H. Berke, I. Povey, P. Willmott, J.-P. Locquet (Corresponding Author)

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Abstract

The new complex yttrium benzoylpivaloylmethanide and its acetonitrile adduct have been characterized by IR, NMR, mass spectroscopy, X-ray structure analysis, and thermogravimetric/differential thermal analysis. In situ flux measurements and mass spectroscopic studies have been performed to test the suitability of this compound as a precursor for the deposition of complex oxide thin films under molecular beam conditions. Finally it has been used to deposit epitaxial Y2O3 (001) thin films on SrTiO3 (001) substrates.

Original languageEnglish
Pages (from-to)127-134
JournalChemistry of Materials
Volume9
Issue number1
DOIs
Publication statusPublished - 1997
MoE publication typeA1 Journal article-refereed

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