Benzoylpivaloylmethanide precursors for the chemical beam epitaxy of oxide thin films: 1. Synthesis, characterization, and use of yttrium benzoylpivaloylmethanide

E. Fritsch; E. Mächler; F. Arrouy; Olli Orama; H. Berke; I. Povey; P. Willmott; J.-P. Locquet

doi:10.1021/cm9602510

Benzoylpivaloylmethanide precursors for the chemical beam epitaxy of oxide thin films: 1. Synthesis, characterization, and use of yttrium benzoylpivaloylmethanide

E. Fritsch, E. Mächler, F. Arrouy, Olli Orama, H. Berke, I. Povey, P. Willmott, J.-P. Locquet (Corresponding Author)

VTT Technical Research Centre of Finland

Research output: Contribution to journal › Article › Scientific › peer-review

5 Citations (Scopus)

Abstract

The new complex yttrium benzoylpivaloylmethanide and its acetonitrile adduct have been characterized by IR, NMR, mass spectroscopy, X-ray structure analysis, and thermogravimetric/differential thermal analysis. In situ flux measurements and mass spectroscopic studies have been performed to test the suitability of this compound as a precursor for the deposition of complex oxide thin films under molecular beam conditions. Finally it has been used to deposit epitaxial Y₂O₃ (001) thin films on SrTiO₃ (001) substrates.

Original language	English
Pages (from-to)	127-134
Journal	Chemistry of Materials
Volume	9
Issue number	1
DOIs	https://doi.org/10.1021/cm9602510
Publication status	Published - 1997
MoE publication type	A1 Journal article-refereed

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title = "Benzoylpivaloylmethanide precursors for the chemical beam epitaxy of oxide thin films: 1. Synthesis, characterization, and use of yttrium benzoylpivaloylmethanide",

abstract = "The new complex yttrium benzoylpivaloylmethanide and its acetonitrile adduct have been characterized by IR, NMR, mass spectroscopy, X-ray structure analysis, and thermogravimetric/differential thermal analysis. In situ flux measurements and mass spectroscopic studies have been performed to test the suitability of this compound as a precursor for the deposition of complex oxide thin films under molecular beam conditions. Finally it has been used to deposit epitaxial Y2O3 (001) thin films on SrTiO3 (001) substrates. ",

author = "E. Fritsch and E. M{\"a}chler and F. Arrouy and Olli Orama and H. Berke and I. Povey and P. Willmott and J.-P. Locquet",

note = "Project code: K6SU00079",

year = "1997",

doi = "10.1021/cm9602510",

language = "English",

volume = "9",

pages = "127--134",

journal = "Chemistry of Materials",

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publisher = "American Chemical Society ACS",

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TY - JOUR

T1 - Benzoylpivaloylmethanide precursors for the chemical beam epitaxy of oxide thin films

T2 - 1. Synthesis, characterization, and use of yttrium benzoylpivaloylmethanide

AU - Fritsch, E.

AU - Mächler, E.

AU - Arrouy, F.

AU - Orama, Olli

AU - Berke, H.

AU - Povey, I.

AU - Willmott, P.

AU - Locquet, J.-P.

N1 - Project code: K6SU00079

PY - 1997

Y1 - 1997

N2 - The new complex yttrium benzoylpivaloylmethanide and its acetonitrile adduct have been characterized by IR, NMR, mass spectroscopy, X-ray structure analysis, and thermogravimetric/differential thermal analysis. In situ flux measurements and mass spectroscopic studies have been performed to test the suitability of this compound as a precursor for the deposition of complex oxide thin films under molecular beam conditions. Finally it has been used to deposit epitaxial Y2O3 (001) thin films on SrTiO3 (001) substrates.

AB - The new complex yttrium benzoylpivaloylmethanide and its acetonitrile adduct have been characterized by IR, NMR, mass spectroscopy, X-ray structure analysis, and thermogravimetric/differential thermal analysis. In situ flux measurements and mass spectroscopic studies have been performed to test the suitability of this compound as a precursor for the deposition of complex oxide thin films under molecular beam conditions. Finally it has been used to deposit epitaxial Y2O3 (001) thin films on SrTiO3 (001) substrates.

U2 - 10.1021/cm9602510

DO - 10.1021/cm9602510

M3 - Article

SN - 0897-4756

VL - 9

SP - 127

EP - 134

JO - Chemistry of Materials

JF - Chemistry of Materials

IS - 1

ER -

Benzoylpivaloylmethanide precursors for the chemical beam epitaxy of oxide thin films: 1. Synthesis, characterization, and use of yttrium benzoylpivaloylmethanide

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