Bidirectional method for optical channel wavequide attenuation measurement by detectors integrated on the wafer

Jaakko Aarnio, Matti Leppihalme

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

2 Citations (Scopus)

Abstract

A new on-wafer bidirectional nondestructive measurement method is demonstrated for measuring losses in three dimensional integrated optical waveguides. A thermally oxidized silicon wafer is used as substrate for silicon nitride multimode waveguides. The measurement is based on p-i-n photodetectors integrated near the waveguide. In order to eliminate the effect of different sensitivities of adjacent p-i-n detectors, the light is launched separately to both ends of the waveguide. The method can be applied to test structures in optoelectronic integrated circuits (OEIC's).
Original languageEnglish
Title of host publicationIntegrated Optics and Optoelectronics
EditorsLeon McCaughan, Mark A. Mentzer, Song-Tsuen Peng, Henry J. Wojtunik, Ka Kha Wong
PublisherInternational Society for Optics and Photonics SPIE
DOIs
Publication statusPublished - 1989
MoE publication typeA4 Article in a conference publication
EventOE/Fibers '89 - Boston, United States
Duration: 5 Sep 19898 Sep 1989

Publication series

SeriesProceedings of SPIE
Volume1177
ISSN0277-786X

Conference

ConferenceOE/Fibers '89
CountryUnited States
CityBoston
Period5/09/898/09/89

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Cite this

Aarnio, J., & Leppihalme, M. (1989). Bidirectional method for optical channel wavequide attenuation measurement by detectors integrated on the wafer. In L. McCaughan, M. A. Mentzer, S-T. Peng, H. J. Wojtunik, & K. K. Wong (Eds.), Integrated Optics and Optoelectronics International Society for Optics and Photonics SPIE. Proceedings of SPIE, Vol.. 1177 https://doi.org/10.1117/12.963331