Binary collision lattice simulation study of model parameters in monocrystalline sputtering

Jari Likonen, Mikko Hautala

Research output: Contribution to journalArticleScientificpeer-review

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Abstract

Cu ejection and sputtering by Ar ions have been studied in the specific case of 5 KeV Ar impinging the (100), (110) and (111) surfaces using the binary collision lattice simulation code COSIPO. The influence of various parameters in treating the binary collisions has been studied.
On the basis of these studied the feasibility of binary collision lattice simulations in connection with sputtering is discussed. The effect of interaction potential on sputtering is studied by using two different potential functions for the ion-atom and atom-atom interaction potentials. The strengths of the potentials have been changed by using various screening lengths and cut-offs. To model electronic stopping both frictional and impact parameter dependent electronic losses are used.
It is found that the angular distributions of the sputtered atoms depend mainly on the atom-atom interaction potential. The iron-atom potential and the electronic stopping have only minor effects.
The yield, however, depends markedly on the inelastic energy losses and the ion-atom potential. The sensitivity of the sputtering yield on the potentials and on the parameters in treating the binary collisions as well as the influence of the simultaneous collisions depend critically on the strength of the potential.
Calculations show that the dependence on these factors is weak if the strengths of the potentials are such that the experimental yield are achieved. Several combinations of the interaction potentials and inelastic losses give good agreement with either experimental yields or angular distributions of sputtered particles.
However, a combination exists that reproduces all the experimental results.
Original languageEnglish
Pages (from-to)4697-4722
JournalJournal of Physics: Condensed Matter
Volume1
Issue number28
DOIs
Publication statusPublished - 1989
MoE publication typeA1 Journal article-refereed

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Sputtering
sputtering
Atoms
collisions
simulation
atoms
Angular distribution
Ions
stopping
angular distribution
electronics
interactions
ions
Energy dissipation
Screening
Iron
ejection
screening
energy dissipation
iron

Cite this

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title = "Binary collision lattice simulation study of model parameters in monocrystalline sputtering",
abstract = "Cu ejection and sputtering by Ar ions have been studied in the specific case of 5 KeV Ar impinging the (100), (110) and (111) surfaces using the binary collision lattice simulation code COSIPO. The influence of various parameters in treating the binary collisions has been studied. On the basis of these studied the feasibility of binary collision lattice simulations in connection with sputtering is discussed. The effect of interaction potential on sputtering is studied by using two different potential functions for the ion-atom and atom-atom interaction potentials. The strengths of the potentials have been changed by using various screening lengths and cut-offs. To model electronic stopping both frictional and impact parameter dependent electronic losses are used. It is found that the angular distributions of the sputtered atoms depend mainly on the atom-atom interaction potential. The iron-atom potential and the electronic stopping have only minor effects. The yield, however, depends markedly on the inelastic energy losses and the ion-atom potential. The sensitivity of the sputtering yield on the potentials and on the parameters in treating the binary collisions as well as the influence of the simultaneous collisions depend critically on the strength of the potential. Calculations show that the dependence on these factors is weak if the strengths of the potentials are such that the experimental yield are achieved. Several combinations of the interaction potentials and inelastic losses give good agreement with either experimental yields or angular distributions of sputtered particles. However, a combination exists that reproduces all the experimental results.",
author = "Jari Likonen and Mikko Hautala",
year = "1989",
doi = "10.1088/0953-8984/1/28/019",
language = "English",
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journal = "Journal of Physics: Condensed Matter",
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}

Binary collision lattice simulation study of model parameters in monocrystalline sputtering. / Likonen, Jari; Hautala, Mikko.

In: Journal of Physics: Condensed Matter, Vol. 1, No. 28, 1989, p. 4697-4722.

Research output: Contribution to journalArticleScientificpeer-review

TY - JOUR

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AU - Likonen, Jari

AU - Hautala, Mikko

PY - 1989

Y1 - 1989

N2 - Cu ejection and sputtering by Ar ions have been studied in the specific case of 5 KeV Ar impinging the (100), (110) and (111) surfaces using the binary collision lattice simulation code COSIPO. The influence of various parameters in treating the binary collisions has been studied. On the basis of these studied the feasibility of binary collision lattice simulations in connection with sputtering is discussed. The effect of interaction potential on sputtering is studied by using two different potential functions for the ion-atom and atom-atom interaction potentials. The strengths of the potentials have been changed by using various screening lengths and cut-offs. To model electronic stopping both frictional and impact parameter dependent electronic losses are used. It is found that the angular distributions of the sputtered atoms depend mainly on the atom-atom interaction potential. The iron-atom potential and the electronic stopping have only minor effects. The yield, however, depends markedly on the inelastic energy losses and the ion-atom potential. The sensitivity of the sputtering yield on the potentials and on the parameters in treating the binary collisions as well as the influence of the simultaneous collisions depend critically on the strength of the potential. Calculations show that the dependence on these factors is weak if the strengths of the potentials are such that the experimental yield are achieved. Several combinations of the interaction potentials and inelastic losses give good agreement with either experimental yields or angular distributions of sputtered particles. However, a combination exists that reproduces all the experimental results.

AB - Cu ejection and sputtering by Ar ions have been studied in the specific case of 5 KeV Ar impinging the (100), (110) and (111) surfaces using the binary collision lattice simulation code COSIPO. The influence of various parameters in treating the binary collisions has been studied. On the basis of these studied the feasibility of binary collision lattice simulations in connection with sputtering is discussed. The effect of interaction potential on sputtering is studied by using two different potential functions for the ion-atom and atom-atom interaction potentials. The strengths of the potentials have been changed by using various screening lengths and cut-offs. To model electronic stopping both frictional and impact parameter dependent electronic losses are used. It is found that the angular distributions of the sputtered atoms depend mainly on the atom-atom interaction potential. The iron-atom potential and the electronic stopping have only minor effects. The yield, however, depends markedly on the inelastic energy losses and the ion-atom potential. The sensitivity of the sputtering yield on the potentials and on the parameters in treating the binary collisions as well as the influence of the simultaneous collisions depend critically on the strength of the potential. Calculations show that the dependence on these factors is weak if the strengths of the potentials are such that the experimental yield are achieved. Several combinations of the interaction potentials and inelastic losses give good agreement with either experimental yields or angular distributions of sputtered particles. However, a combination exists that reproduces all the experimental results.

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