Binary collision lattice simulation study of model parameters in monocrystalline sputtering

Jari Likonen, Mikko Hautala

    Research output: Contribution to journalArticleScientificpeer-review

    15 Citations (Scopus)

    Abstract

    Cu ejection and sputtering by Ar ions have been studied in the specific case of 5 KeV Ar impinging the (100), (110) and (111) surfaces using the binary collision lattice simulation code COSIPO. The influence of various parameters in treating the binary collisions has been studied.
    On the basis of these studied the feasibility of binary collision lattice simulations in connection with sputtering is discussed. The effect of interaction potential on sputtering is studied by using two different potential functions for the ion-atom and atom-atom interaction potentials. The strengths of the potentials have been changed by using various screening lengths and cut-offs. To model electronic stopping both frictional and impact parameter dependent electronic losses are used.
    It is found that the angular distributions of the sputtered atoms depend mainly on the atom-atom interaction potential. The iron-atom potential and the electronic stopping have only minor effects.
    The yield, however, depends markedly on the inelastic energy losses and the ion-atom potential. The sensitivity of the sputtering yield on the potentials and on the parameters in treating the binary collisions as well as the influence of the simultaneous collisions depend critically on the strength of the potential.
    Calculations show that the dependence on these factors is weak if the strengths of the potentials are such that the experimental yield are achieved. Several combinations of the interaction potentials and inelastic losses give good agreement with either experimental yields or angular distributions of sputtered particles.
    However, a combination exists that reproduces all the experimental results.
    Original languageEnglish
    Pages (from-to)4697-4722
    JournalJournal of Physics: Condensed Matter
    Volume1
    Issue number28
    DOIs
    Publication statusPublished - 1989
    MoE publication typeA1 Journal article-refereed

    Fingerprint

    Sputtering
    sputtering
    Atoms
    collisions
    simulation
    atoms
    Angular distribution
    Ions
    stopping
    angular distribution
    electronics
    interactions
    ions
    Energy dissipation
    Screening
    Iron
    ejection
    screening
    energy dissipation
    iron

    Cite this

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    title = "Binary collision lattice simulation study of model parameters in monocrystalline sputtering",
    abstract = "Cu ejection and sputtering by Ar ions have been studied in the specific case of 5 KeV Ar impinging the (100), (110) and (111) surfaces using the binary collision lattice simulation code COSIPO. The influence of various parameters in treating the binary collisions has been studied. On the basis of these studied the feasibility of binary collision lattice simulations in connection with sputtering is discussed. The effect of interaction potential on sputtering is studied by using two different potential functions for the ion-atom and atom-atom interaction potentials. The strengths of the potentials have been changed by using various screening lengths and cut-offs. To model electronic stopping both frictional and impact parameter dependent electronic losses are used. It is found that the angular distributions of the sputtered atoms depend mainly on the atom-atom interaction potential. The iron-atom potential and the electronic stopping have only minor effects. The yield, however, depends markedly on the inelastic energy losses and the ion-atom potential. The sensitivity of the sputtering yield on the potentials and on the parameters in treating the binary collisions as well as the influence of the simultaneous collisions depend critically on the strength of the potential. Calculations show that the dependence on these factors is weak if the strengths of the potentials are such that the experimental yield are achieved. Several combinations of the interaction potentials and inelastic losses give good agreement with either experimental yields or angular distributions of sputtered particles. However, a combination exists that reproduces all the experimental results.",
    author = "Jari Likonen and Mikko Hautala",
    year = "1989",
    doi = "10.1088/0953-8984/1/28/019",
    language = "English",
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    Binary collision lattice simulation study of model parameters in monocrystalline sputtering. / Likonen, Jari; Hautala, Mikko.

    In: Journal of Physics: Condensed Matter, Vol. 1, No. 28, 1989, p. 4697-4722.

    Research output: Contribution to journalArticleScientificpeer-review

    TY - JOUR

    T1 - Binary collision lattice simulation study of model parameters in monocrystalline sputtering

    AU - Likonen, Jari

    AU - Hautala, Mikko

    PY - 1989

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    N2 - Cu ejection and sputtering by Ar ions have been studied in the specific case of 5 KeV Ar impinging the (100), (110) and (111) surfaces using the binary collision lattice simulation code COSIPO. The influence of various parameters in treating the binary collisions has been studied. On the basis of these studied the feasibility of binary collision lattice simulations in connection with sputtering is discussed. The effect of interaction potential on sputtering is studied by using two different potential functions for the ion-atom and atom-atom interaction potentials. The strengths of the potentials have been changed by using various screening lengths and cut-offs. To model electronic stopping both frictional and impact parameter dependent electronic losses are used. It is found that the angular distributions of the sputtered atoms depend mainly on the atom-atom interaction potential. The iron-atom potential and the electronic stopping have only minor effects. The yield, however, depends markedly on the inelastic energy losses and the ion-atom potential. The sensitivity of the sputtering yield on the potentials and on the parameters in treating the binary collisions as well as the influence of the simultaneous collisions depend critically on the strength of the potential. Calculations show that the dependence on these factors is weak if the strengths of the potentials are such that the experimental yield are achieved. Several combinations of the interaction potentials and inelastic losses give good agreement with either experimental yields or angular distributions of sputtered particles. However, a combination exists that reproduces all the experimental results.

    AB - Cu ejection and sputtering by Ar ions have been studied in the specific case of 5 KeV Ar impinging the (100), (110) and (111) surfaces using the binary collision lattice simulation code COSIPO. The influence of various parameters in treating the binary collisions has been studied. On the basis of these studied the feasibility of binary collision lattice simulations in connection with sputtering is discussed. The effect of interaction potential on sputtering is studied by using two different potential functions for the ion-atom and atom-atom interaction potentials. The strengths of the potentials have been changed by using various screening lengths and cut-offs. To model electronic stopping both frictional and impact parameter dependent electronic losses are used. It is found that the angular distributions of the sputtered atoms depend mainly on the atom-atom interaction potential. The iron-atom potential and the electronic stopping have only minor effects. The yield, however, depends markedly on the inelastic energy losses and the ion-atom potential. The sensitivity of the sputtering yield on the potentials and on the parameters in treating the binary collisions as well as the influence of the simultaneous collisions depend critically on the strength of the potential. Calculations show that the dependence on these factors is weak if the strengths of the potentials are such that the experimental yield are achieved. Several combinations of the interaction potentials and inelastic losses give good agreement with either experimental yields or angular distributions of sputtered particles. However, a combination exists that reproduces all the experimental results.

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