Biocompatible ALD barrier coatings for medical devices

Mikko Matvejeff; Satu Ek; Riina Ritasalo; Jesse Kalliomäki; Päivi Järvinen; Oili Ylivaara; Erik Östreng

doi:10.1109/EDTM.2017.7947504

Biocompatible ALD barrier coatings for medical devices

Mikko Matvejeff
, Satu Ek
, Riina Ritasalo
, Jesse Kalliomäki
, Päivi Järvinen
, Oili Ylivaara
, Erik Östreng

Picosun Oy

Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review

2 Citations (Scopus)

Abstract

Atomic layer deposition (ALD) is widely in use for depositing a variety of materials, such as metal oxides, metal nitrides and metals, in a conformal and defect-free form at low temperatures on high aspect-ratio substrates. These advantages make ALD uniquely powerful method for applications where sensitive substrate materials combine with extreme demands on coating quality and temperature/chemical resistance, such as those often seen in the medical applications.

Original language	English
Title of host publication	Proceedings of 2017 IEEE Electron Devices Technology and Manufacturing Conference (EDTM)
Publisher	IEEE Institute of Electrical and Electronic Engineers
Pages	56-58
ISBN (Electronic)	978-1-5090-4660-7
ISBN (Print)	978-1-5090-4661-4
DOIs	https://doi.org/10.1109/EDTM.2017.7947504
Publication status	Published - 13 Jun 2017
MoE publication type	A4 Article in a conference publication
Event	Electron Devices Technology and Manufacturing Coneference, EDTM 2017 - Toyama, Japan Duration: 28 Feb 2017 → 2 Mar 2017

Conference

Conference	Electron Devices Technology and Manufacturing Coneference, EDTM 2017
Abbreviated title	EDTM 2017
Country/Territory	Japan
City	Toyama
Period	28/02/17 → 2/03/17

Keywords

atomic layer deposition
ALD
medical device and barrier layer
otanano

Access to Document

10.1109/EDTM.2017.7947504

Cite this

Matvejeff, M., Ek, S., Ritasalo, R., Kalliomäki, J., Järvinen, P., Ylivaara, O., & Östreng, E. (2017). Biocompatible ALD barrier coatings for medical devices. In Proceedings of 2017 IEEE Electron Devices Technology and Manufacturing Conference (EDTM) (pp. 56-58). Article 7947504 IEEE Institute of Electrical and Electronic Engineers. https://doi.org/10.1109/EDTM.2017.7947504

@inproceedings{5e72ed2cfa7d40fea9db84cac4df59c3,

title = "Biocompatible ALD barrier coatings for medical devices",

abstract = "Atomic layer deposition (ALD) is widely in use for depositing a variety of materials, such as metal oxides, metal nitrides and metals, in a conformal and defect-free form at low temperatures on high aspect-ratio substrates. These advantages make ALD uniquely powerful method for applications where sensitive substrate materials combine with extreme demands on coating quality and temperature/chemical resistance, such as those often seen in the medical applications.",

keywords = "atomic layer deposition, ALD, medical device and barrier layer, otanano",

author = "Mikko Matvejeff and Satu Ek and Riina Ritasalo and Jesse Kalliom{\"a}ki and P{\"a}ivi J{\"a}rvinen and Oili Ylivaara and Erik {\"O}streng",

note = "Invited presentation ; Electron Devices Technology and Manufacturing Coneference, EDTM 2017, EDTM 2017 ; Conference date: 28-02-2017 Through 02-03-2017",

year = "2017",

month = jun,

day = "13",

doi = "10.1109/EDTM.2017.7947504",

language = "English",

isbn = "978-1-5090-4661-4",

pages = "56--58",

booktitle = "Proceedings of 2017 IEEE Electron Devices Technology and Manufacturing Conference (EDTM)",

publisher = "IEEE Institute of Electrical and Electronic Engineers",

address = "United States",

}

Matvejeff, M, Ek, S, Ritasalo, R, Kalliomäki, J, Järvinen, P, Ylivaara, O & Östreng, E 2017, Biocompatible ALD barrier coatings for medical devices. in Proceedings of 2017 IEEE Electron Devices Technology and Manufacturing Conference (EDTM)., 7947504, IEEE Institute of Electrical and Electronic Engineers, pp. 56-58, Electron Devices Technology and Manufacturing Coneference, EDTM 2017, Toyama, Japan, 28/02/17. https://doi.org/10.1109/EDTM.2017.7947504

Biocompatible ALD barrier coatings for medical devices. / Matvejeff, Mikko; Ek, Satu; Ritasalo, Riina et al.
Proceedings of 2017 IEEE Electron Devices Technology and Manufacturing Conference (EDTM). IEEE Institute of Electrical and Electronic Engineers, 2017. p. 56-58 7947504.

Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review

TY - GEN

T1 - Biocompatible ALD barrier coatings for medical devices

AU - Matvejeff, Mikko

AU - Ek, Satu

AU - Ritasalo, Riina

AU - Kalliomäki, Jesse

AU - Järvinen, Päivi

AU - Ylivaara, Oili

AU - Östreng, Erik

N1 - Invited presentation

PY - 2017/6/13

Y1 - 2017/6/13

N2 - Atomic layer deposition (ALD) is widely in use for depositing a variety of materials, such as metal oxides, metal nitrides and metals, in a conformal and defect-free form at low temperatures on high aspect-ratio substrates. These advantages make ALD uniquely powerful method for applications where sensitive substrate materials combine with extreme demands on coating quality and temperature/chemical resistance, such as those often seen in the medical applications.

AB - Atomic layer deposition (ALD) is widely in use for depositing a variety of materials, such as metal oxides, metal nitrides and metals, in a conformal and defect-free form at low temperatures on high aspect-ratio substrates. These advantages make ALD uniquely powerful method for applications where sensitive substrate materials combine with extreme demands on coating quality and temperature/chemical resistance, such as those often seen in the medical applications.

KW - atomic layer deposition

KW - ALD

KW - medical device and barrier layer

KW - otanano

UR - https://www.scopus.com/pages/publications/85021989395

U2 - 10.1109/EDTM.2017.7947504

DO - 10.1109/EDTM.2017.7947504

M3 - Conference article in proceedings

SN - 978-1-5090-4661-4

SP - 56

EP - 58

BT - Proceedings of 2017 IEEE Electron Devices Technology and Manufacturing Conference (EDTM)

PB - IEEE Institute of Electrical and Electronic Engineers

T2 - Electron Devices Technology and Manufacturing Coneference, EDTM 2017

Y2 - 28 February 2017 through 2 March 2017

ER -

Biocompatible ALD barrier coatings for medical devices

Abstract

Conference

Keywords

Access to Document

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Fingerprint

InForMed: An integrated pilot line for micro-fabricated medical devices

OtaNano

Cite this

Biocompatible ALD barrier coatings for medical devices

Abstract

Conference

Keywords

Access to Document

Other files and links

Fingerprint

Projects

InForMed: An integrated pilot line for micro-fabricated medical devices

Equipment

OtaNano

Cite this