Bragg reflectors for large optical aperture MEMS fabry-perot interferometers

Anna Rissanen, Rami Mannila, Jarkko Antila

    Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

    9 Citations (Scopus)

    Abstract

    This paper presents the fabrication of large-aperture low-pressure chemical-vapour deposited (LPCVD) Bragg reflectors utilizing low-stress polysilicon (PolySi) and silicon-rich silicon nitride (SiN) ?/4-thin film stacks. These structures can function as the upper mirror in a MEMS FPI device. High aspect-ratio mirror membranes were successfully released for 5 - 10 mm diameter range by sacrificial SiO2 etching in HF vapour. Optical simulations are presented for the Bragg reflector test structures designed for FPIs operating in the NIR range and the properties such as release yield and mechanical stability of the released LPCVD deposited polySi-SiN mirror membranes are compared with similar released atomic layer deposited (ALD) Al2O3-TiO2 ?/4-thin film mirror stacks. The realization of these Bragg reflector structures is the first step in the process integration of large-aperture MEMS FPI for miniature NIR imaging spectrometers, which can be applied to a variety of applications ranging from medical imaging and diagnostics to spaceand environmental monitoring instrumentation
    Original languageEnglish
    Title of host publicationMicro- and Nanotechnology Sensors, Systems, and Applications IV
    EditorsGeorge Tom
    PublisherInternational Society for Optics and Photonics SPIE
    ISBN (Print)978-0-8194-9051-3
    DOIs
    Publication statusPublished - 2012
    MoE publication typeA4 Article in a conference publication
    EventMicro- and Nanotechnology Sensors, Systems, and Applications IV - Baltimore, MD, United States
    Duration: 23 Apr 201227 Apr 2012

    Publication series

    SeriesProceedings of SPIE
    Volume8373
    ISSN0277-786X

    Conference

    ConferenceMicro- and Nanotechnology Sensors, Systems, and Applications IV
    CountryUnited States
    CityBaltimore, MD
    Period23/04/1227/04/12

    Fingerprint

    Fabry-Perot interferometers
    Bragg reflectors
    microelectromechanical systems
    apertures
    mirrors
    vapors
    silicon nitrides
    low pressure
    membranes
    environmental monitoring
    imaging spectrometers
    thin films
    high aspect ratio
    etching
    fabrication
    silicon
    simulation

    Keywords

    • Bragg mirror
    • imaging
    • mems fabry-perot interferometer
    • spectroscopy

    Cite this

    Rissanen, A., Mannila, R., & Antila, J. (2012). Bragg reflectors for large optical aperture MEMS fabry-perot interferometers. In G. Tom (Ed.), Micro- and Nanotechnology Sensors, Systems, and Applications IV [83732R] International Society for Optics and Photonics SPIE. Proceedings of SPIE, Vol.. 8373 https://doi.org/10.1117/12.920578
    Rissanen, Anna ; Mannila, Rami ; Antila, Jarkko. / Bragg reflectors for large optical aperture MEMS fabry-perot interferometers. Micro- and Nanotechnology Sensors, Systems, and Applications IV. editor / George Tom. International Society for Optics and Photonics SPIE, 2012. (Proceedings of SPIE, Vol. 8373).
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    abstract = "This paper presents the fabrication of large-aperture low-pressure chemical-vapour deposited (LPCVD) Bragg reflectors utilizing low-stress polysilicon (PolySi) and silicon-rich silicon nitride (SiN) ?/4-thin film stacks. These structures can function as the upper mirror in a MEMS FPI device. High aspect-ratio mirror membranes were successfully released for 5 - 10 mm diameter range by sacrificial SiO2 etching in HF vapour. Optical simulations are presented for the Bragg reflector test structures designed for FPIs operating in the NIR range and the properties such as release yield and mechanical stability of the released LPCVD deposited polySi-SiN mirror membranes are compared with similar released atomic layer deposited (ALD) Al2O3-TiO2 ?/4-thin film mirror stacks. The realization of these Bragg reflector structures is the first step in the process integration of large-aperture MEMS FPI for miniature NIR imaging spectrometers, which can be applied to a variety of applications ranging from medical imaging and diagnostics to spaceand environmental monitoring instrumentation",
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    Rissanen, A, Mannila, R & Antila, J 2012, Bragg reflectors for large optical aperture MEMS fabry-perot interferometers. in G Tom (ed.), Micro- and Nanotechnology Sensors, Systems, and Applications IV., 83732R, International Society for Optics and Photonics SPIE, Proceedings of SPIE, vol. 8373, Micro- and Nanotechnology Sensors, Systems, and Applications IV, Baltimore, MD, United States, 23/04/12. https://doi.org/10.1117/12.920578

    Bragg reflectors for large optical aperture MEMS fabry-perot interferometers. / Rissanen, Anna; Mannila, Rami; Antila, Jarkko.

    Micro- and Nanotechnology Sensors, Systems, and Applications IV. ed. / George Tom. International Society for Optics and Photonics SPIE, 2012. 83732R (Proceedings of SPIE, Vol. 8373).

    Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

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    N2 - This paper presents the fabrication of large-aperture low-pressure chemical-vapour deposited (LPCVD) Bragg reflectors utilizing low-stress polysilicon (PolySi) and silicon-rich silicon nitride (SiN) ?/4-thin film stacks. These structures can function as the upper mirror in a MEMS FPI device. High aspect-ratio mirror membranes were successfully released for 5 - 10 mm diameter range by sacrificial SiO2 etching in HF vapour. Optical simulations are presented for the Bragg reflector test structures designed for FPIs operating in the NIR range and the properties such as release yield and mechanical stability of the released LPCVD deposited polySi-SiN mirror membranes are compared with similar released atomic layer deposited (ALD) Al2O3-TiO2 ?/4-thin film mirror stacks. The realization of these Bragg reflector structures is the first step in the process integration of large-aperture MEMS FPI for miniature NIR imaging spectrometers, which can be applied to a variety of applications ranging from medical imaging and diagnostics to spaceand environmental monitoring instrumentation

    AB - This paper presents the fabrication of large-aperture low-pressure chemical-vapour deposited (LPCVD) Bragg reflectors utilizing low-stress polysilicon (PolySi) and silicon-rich silicon nitride (SiN) ?/4-thin film stacks. These structures can function as the upper mirror in a MEMS FPI device. High aspect-ratio mirror membranes were successfully released for 5 - 10 mm diameter range by sacrificial SiO2 etching in HF vapour. Optical simulations are presented for the Bragg reflector test structures designed for FPIs operating in the NIR range and the properties such as release yield and mechanical stability of the released LPCVD deposited polySi-SiN mirror membranes are compared with similar released atomic layer deposited (ALD) Al2O3-TiO2 ?/4-thin film mirror stacks. The realization of these Bragg reflector structures is the first step in the process integration of large-aperture MEMS FPI for miniature NIR imaging spectrometers, which can be applied to a variety of applications ranging from medical imaging and diagnostics to spaceand environmental monitoring instrumentation

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    Rissanen A, Mannila R, Antila J. Bragg reflectors for large optical aperture MEMS fabry-perot interferometers. In Tom G, editor, Micro- and Nanotechnology Sensors, Systems, and Applications IV. International Society for Optics and Photonics SPIE. 2012. 83732R. (Proceedings of SPIE, Vol. 8373). https://doi.org/10.1117/12.920578