INIS
apertures
100%
mirrors
100%
fabry-perot interferometer
100%
chemical vapor deposition
50%
membranes
50%
range
50%
thin films
50%
stacks
50%
low pressure
50%
silicon nitrides
50%
simulation
25%
layers
25%
comparative evaluations
25%
applications
25%
devices
25%
silicon
25%
aspect ratio
25%
stability
25%
monitoring
25%
titanium oxides
25%
vapors
25%
yields
25%
fabrication
25%
spectrometers
25%
biomedical radiography
25%
etching
25%
Keyphrases
MEMS Fabry-Perot Interferometer
100%
Optical Aperture
100%
Bragg Reflector
100%
Low Pressure
50%
Large Aperture
50%
Chemical Vapor
50%
Silicon Nitride
50%
High Aspect Ratio
25%
Low Stress
25%
TiO2-Al2O3
25%
Mechanical Stability
25%
Environmental Monitoring
25%
Imaging Spectrometer
25%
Process Integration
25%
Medical Imaging
25%
Atomic Layer Deposited
25%
Optical Simulation
25%
Medical Diagnostics
25%
NIR Range
25%
Poly-Si
25%
HF Gas
25%
SiO2 Etching
25%
Polysilicon
25%
Thin Film Stacks
25%
NIR Imaging
25%
Yield Stability
25%
Diameter Ranges
25%
Reflective Structure
25%
Engineering
Microelectromechanical System
100%
Fabry Perot
100%
Bragg Cell
100%
Perot Interferometer
100%
Larger Aperture
50%
Thin Films
50%
Nitride
50%
Test Structure
25%
Atomic Layer
25%
Process Integration
25%
Mm Diameter
25%
Realization
25%
High Aspect Ratio
25%
Mechanical Stability
25%
Silicon Dioxide
25%
Polysilicon
25%
Material Science
Interferometer
100%
Microelectromechanical System
100%
Silicon Nitride
66%
Thin Films
66%
Al2O3
33%
Mechanical Stability
33%
Titanium Dioxide
33%
Silicon
33%
Physics
Fabry-Perot Interferometer
100%
Bragg Reflector
100%
Microelectromechanical System
100%
Thin Films
50%
Silicon Nitride
50%
Aspect Ratio
25%