Characterization and performance of diamond-like carbon films synthesized by plasma- and ion-beam-based techniques

K. Walter, Harriet Kung, T. Levine, Padma Kodali, B. Wood, Donald Rej, Michael Nastasi, Jari Koskinen, Juha-Pekka Hirvonen

Research output: Contribution to journalArticleScientificpeer-review

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Abstract

Diamond-like carbon (DLC) films have been deposited on dissimilar substrates using three different deposition processes. Two well-studied deposition methods, employing cathodic arcs and r.f. plasma self-bias, have been used. These two processes differ in that cathodic arc processes use gas pressures less than 1 mTorr (0.13 Pa) and deposit atomic ions with energies less than 100 eV, while r.f. plasma self-bias processes use gas pressures greater than 1 mTorr (0.13 Pa) and deposit molecular ions with energies greater than 100 eV. In addition, DLC films have been deposited using a new plasma-based, pulsed-bias process. The pulsed-bias process uses gas pressures greater than 1 mTorr (0.13 Pa) and deposits molecular ions with energies greater than 1000 eV. Both the self-bias and the pulsed-bias processes utilized hydrocarbon gases as the carbon source. Cathodic arc processes generally rely on the arc between two graphite electrodes as the carbon source. Deposited films from all three processes have been characterized using ion backscattering techniques, elastic recoil spectrometry, transmission electron microscopy (TEM) and selected-area diffraction. Films deposited using the cathodic arc process are virtually hydrogen free while the self-bias and pulsed-bias films contain up to 40% H. TEM results indicated that the films are homogeneous and amorphous. The hardness, elastic modulus, coefficient of friction and wear rate of the films are also reported.
Original languageEnglish
Pages (from-to)734-738
JournalSurface and Coatings Technology
Volume74-75
Issue numberPart 2
DOIs
Publication statusPublished - 1995
MoE publication typeA1 Journal article-refereed
EventFourth International Conference on Plasma Surface Engineering - Garmisch-Partenkirchen, Germany
Duration: 19 Sep 199423 Sep 1994

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Diamond like carbon films
Ion beams
diamonds
ion beams
Plasmas
Gases
carbon
Ions
arcs
Deposits
gas pressure
Carbon
deposits
Transmission electron microscopy
molecular ions
Graphite electrodes
Backscattering
Hydrocarbons
Spectrometry
Hydrogen

Cite this

Walter, K. ; Kung, Harriet ; Levine, T. ; Kodali, Padma ; Wood, B. ; Rej, Donald ; Nastasi, Michael ; Koskinen, Jari ; Hirvonen, Juha-Pekka. / Characterization and performance of diamond-like carbon films synthesized by plasma- and ion-beam-based techniques. In: Surface and Coatings Technology. 1995 ; Vol. 74-75, No. Part 2. pp. 734-738.
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abstract = "Diamond-like carbon (DLC) films have been deposited on dissimilar substrates using three different deposition processes. Two well-studied deposition methods, employing cathodic arcs and r.f. plasma self-bias, have been used. These two processes differ in that cathodic arc processes use gas pressures less than 1 mTorr (0.13 Pa) and deposit atomic ions with energies less than 100 eV, while r.f. plasma self-bias processes use gas pressures greater than 1 mTorr (0.13 Pa) and deposit molecular ions with energies greater than 100 eV. In addition, DLC films have been deposited using a new plasma-based, pulsed-bias process. The pulsed-bias process uses gas pressures greater than 1 mTorr (0.13 Pa) and deposits molecular ions with energies greater than 1000 eV. Both the self-bias and the pulsed-bias processes utilized hydrocarbon gases as the carbon source. Cathodic arc processes generally rely on the arc between two graphite electrodes as the carbon source. Deposited films from all three processes have been characterized using ion backscattering techniques, elastic recoil spectrometry, transmission electron microscopy (TEM) and selected-area diffraction. Films deposited using the cathodic arc process are virtually hydrogen free while the self-bias and pulsed-bias films contain up to 40{\%} H. TEM results indicated that the films are homogeneous and amorphous. The hardness, elastic modulus, coefficient of friction and wear rate of the films are also reported.",
author = "K. Walter and Harriet Kung and T. Levine and Padma Kodali and B. Wood and Donald Rej and Michael Nastasi and Jari Koskinen and Juha-Pekka Hirvonen",
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doi = "10.1016/0257-8972(94)08203-0",
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Walter, K, Kung, H, Levine, T, Kodali, P, Wood, B, Rej, D, Nastasi, M, Koskinen, J & Hirvonen, J-P 1995, 'Characterization and performance of diamond-like carbon films synthesized by plasma- and ion-beam-based techniques', Surface and Coatings Technology, vol. 74-75, no. Part 2, pp. 734-738. https://doi.org/10.1016/0257-8972(94)08203-0

Characterization and performance of diamond-like carbon films synthesized by plasma- and ion-beam-based techniques. / Walter, K.; Kung, Harriet; Levine, T.; Kodali, Padma; Wood, B.; Rej, Donald; Nastasi, Michael; Koskinen, Jari; Hirvonen, Juha-Pekka.

In: Surface and Coatings Technology, Vol. 74-75, No. Part 2, 1995, p. 734-738.

Research output: Contribution to journalArticleScientificpeer-review

TY - JOUR

T1 - Characterization and performance of diamond-like carbon films synthesized by plasma- and ion-beam-based techniques

AU - Walter, K.

AU - Kung, Harriet

AU - Levine, T.

AU - Kodali, Padma

AU - Wood, B.

AU - Rej, Donald

AU - Nastasi, Michael

AU - Koskinen, Jari

AU - Hirvonen, Juha-Pekka

PY - 1995

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N2 - Diamond-like carbon (DLC) films have been deposited on dissimilar substrates using three different deposition processes. Two well-studied deposition methods, employing cathodic arcs and r.f. plasma self-bias, have been used. These two processes differ in that cathodic arc processes use gas pressures less than 1 mTorr (0.13 Pa) and deposit atomic ions with energies less than 100 eV, while r.f. plasma self-bias processes use gas pressures greater than 1 mTorr (0.13 Pa) and deposit molecular ions with energies greater than 100 eV. In addition, DLC films have been deposited using a new plasma-based, pulsed-bias process. The pulsed-bias process uses gas pressures greater than 1 mTorr (0.13 Pa) and deposits molecular ions with energies greater than 1000 eV. Both the self-bias and the pulsed-bias processes utilized hydrocarbon gases as the carbon source. Cathodic arc processes generally rely on the arc between two graphite electrodes as the carbon source. Deposited films from all three processes have been characterized using ion backscattering techniques, elastic recoil spectrometry, transmission electron microscopy (TEM) and selected-area diffraction. Films deposited using the cathodic arc process are virtually hydrogen free while the self-bias and pulsed-bias films contain up to 40% H. TEM results indicated that the films are homogeneous and amorphous. The hardness, elastic modulus, coefficient of friction and wear rate of the films are also reported.

AB - Diamond-like carbon (DLC) films have been deposited on dissimilar substrates using three different deposition processes. Two well-studied deposition methods, employing cathodic arcs and r.f. plasma self-bias, have been used. These two processes differ in that cathodic arc processes use gas pressures less than 1 mTorr (0.13 Pa) and deposit atomic ions with energies less than 100 eV, while r.f. plasma self-bias processes use gas pressures greater than 1 mTorr (0.13 Pa) and deposit molecular ions with energies greater than 100 eV. In addition, DLC films have been deposited using a new plasma-based, pulsed-bias process. The pulsed-bias process uses gas pressures greater than 1 mTorr (0.13 Pa) and deposits molecular ions with energies greater than 1000 eV. Both the self-bias and the pulsed-bias processes utilized hydrocarbon gases as the carbon source. Cathodic arc processes generally rely on the arc between two graphite electrodes as the carbon source. Deposited films from all three processes have been characterized using ion backscattering techniques, elastic recoil spectrometry, transmission electron microscopy (TEM) and selected-area diffraction. Films deposited using the cathodic arc process are virtually hydrogen free while the self-bias and pulsed-bias films contain up to 40% H. TEM results indicated that the films are homogeneous and amorphous. The hardness, elastic modulus, coefficient of friction and wear rate of the films are also reported.

U2 - 10.1016/0257-8972(94)08203-0

DO - 10.1016/0257-8972(94)08203-0

M3 - Article

VL - 74-75

SP - 734

EP - 738

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

SN - 0257-8972

IS - Part 2

ER -