@inproceedings{0685a8744d5240c8be6389a45239ebbb,
title = "Characterization of W-N alloys formed by sputter deposition",
abstract = "Thin films of W-N alloys have been prepared by reactive rf sputtering from a W target. Alloy compositions up to about 65at.\%N, can be achieved by this method. The structure and stability of these films have been studied using x-ray diffraction analysis. Between 18 and 38at.\%N, amorphous phases are formed with crystallization temperatures up to above 600°C. All the films gradually release N upon vacuum annealing and decompose into αW between 700 and 800°C in vacuo. Application of W-N alloys as diffusion barriers in a Si metallization scheme is discussed.",
author = "Klaus Affolter and Hannu Kattelus and Marc Nicolet",
year = "1985",
doi = "10.1557/PROC-47-167",
language = "English",
isbn = "978-0-931837-12-8",
series = "Materials Research Society Symposia Proceedings",
publisher = "Materials Research Society",
pages = "167--173",
editor = "Aita, \{Carolyn Rubin\} and K.S. SreeHarsha",
booktitle = "Thin Films",
address = "United States",
note = "Materials Research Society 1985 Spring Meeting ; Conference date: 15-04-1985 Through 17-04-1985",
}