Characterization of wet chemistry resist and resist residues removal processes

Esa Muukkonen, Teija Häkkinen, Tarja Riihisaari, Simo Eränen, Ismo Luusua, Arto Kiviranta, Pekka Savolahti

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    Abstract

    Light scattering measurement equipment was used in setting up a resist removal and cleaning process. The resist residue removal efficiency of the SCI bath after unsuccessful resist stripping was tested. Metal contamination loading was measured with Total reflection x-ray Fluorescence (TXRF) equipment. Chemical analysis methods and in situ monitoring were used to study aging of the bath.
    Original languageEnglish
    Pages (from-to)255-258
    Number of pages4
    JournalPhysica Scripta
    VolumeT79
    DOIs
    Publication statusPublished - 1999
    MoE publication typeA1 Journal article-refereed

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    Muukkonen, E., Häkkinen, T., Riihisaari, T., Eränen, S., Luusua, I., Kiviranta, A., & Savolahti, P. (1999). Characterization of wet chemistry resist and resist residues removal processes. Physica Scripta, T79, 255-258. https://doi.org/10.1238/Physica.Topical.079a00255