Characterization of wet chemistry resist and resist residues removal processes

Esa Muukkonen, Teija Häkkinen, Tarja Riihisaari, Simo Eränen, Ismo Luusua, Arto Kiviranta, Pekka Savolahti

Research output: Contribution to journalArticleScientificpeer-review

Abstract

Light scattering measurement equipment was used in setting up a resist removal and cleaning process. The resist residue removal efficiency of the SCI bath after unsuccessful resist stripping was tested. Metal contamination loading was measured with Total reflection x-ray Fluorescence (TXRF) equipment. Chemical analysis methods and in situ monitoring were used to study aging of the bath.
Original languageEnglish
Pages (from-to)255-258
Number of pages4
JournalPhysica Scripta
VolumeT79
DOIs
Publication statusPublished - 1999
MoE publication typeA1 Journal article-refereed

Fingerprint

Resist
Chemistry
baths
chemistry
x ray fluorescence
stripping
chemical analysis
cleaning
Chemical Analysis
contamination
light scattering
Cleaning
Light Scattering
Contamination
Fluorescence
Metals
Monitoring
metals

Cite this

Muukkonen, E., Häkkinen, T., Riihisaari, T., Eränen, S., Luusua, I., Kiviranta, A., & Savolahti, P. (1999). Characterization of wet chemistry resist and resist residues removal processes. Physica Scripta, T79, 255-258. https://doi.org/10.1238/Physica.Topical.079a00255
Muukkonen, Esa ; Häkkinen, Teija ; Riihisaari, Tarja ; Eränen, Simo ; Luusua, Ismo ; Kiviranta, Arto ; Savolahti, Pekka. / Characterization of wet chemistry resist and resist residues removal processes. In: Physica Scripta. 1999 ; Vol. T79. pp. 255-258.
@article{5d55445a3bd1432f817068e43bfca0db,
title = "Characterization of wet chemistry resist and resist residues removal processes",
abstract = "Light scattering measurement equipment was used in setting up a resist removal and cleaning process. The resist residue removal efficiency of the SCI bath after unsuccessful resist stripping was tested. Metal contamination loading was measured with Total reflection x-ray Fluorescence (TXRF) equipment. Chemical analysis methods and in situ monitoring were used to study aging of the bath.",
author = "Esa Muukkonen and Teija H{\"a}kkinen and Tarja Riihisaari and Simo Er{\"a}nen and Ismo Luusua and Arto Kiviranta and Pekka Savolahti",
year = "1999",
doi = "10.1238/Physica.Topical.079a00255",
language = "English",
volume = "T79",
pages = "255--258",
journal = "Physica Scripta",
issn = "0031-8949",
publisher = "Institute of Physics IOP",

}

Muukkonen, E, Häkkinen, T, Riihisaari, T, Eränen, S, Luusua, I, Kiviranta, A & Savolahti, P 1999, 'Characterization of wet chemistry resist and resist residues removal processes', Physica Scripta, vol. T79, pp. 255-258. https://doi.org/10.1238/Physica.Topical.079a00255

Characterization of wet chemistry resist and resist residues removal processes. / Muukkonen, Esa; Häkkinen, Teija; Riihisaari, Tarja; Eränen, Simo; Luusua, Ismo; Kiviranta, Arto; Savolahti, Pekka.

In: Physica Scripta, Vol. T79, 1999, p. 255-258.

Research output: Contribution to journalArticleScientificpeer-review

TY - JOUR

T1 - Characterization of wet chemistry resist and resist residues removal processes

AU - Muukkonen, Esa

AU - Häkkinen, Teija

AU - Riihisaari, Tarja

AU - Eränen, Simo

AU - Luusua, Ismo

AU - Kiviranta, Arto

AU - Savolahti, Pekka

PY - 1999

Y1 - 1999

N2 - Light scattering measurement equipment was used in setting up a resist removal and cleaning process. The resist residue removal efficiency of the SCI bath after unsuccessful resist stripping was tested. Metal contamination loading was measured with Total reflection x-ray Fluorescence (TXRF) equipment. Chemical analysis methods and in situ monitoring were used to study aging of the bath.

AB - Light scattering measurement equipment was used in setting up a resist removal and cleaning process. The resist residue removal efficiency of the SCI bath after unsuccessful resist stripping was tested. Metal contamination loading was measured with Total reflection x-ray Fluorescence (TXRF) equipment. Chemical analysis methods and in situ monitoring were used to study aging of the bath.

U2 - 10.1238/Physica.Topical.079a00255

DO - 10.1238/Physica.Topical.079a00255

M3 - Article

VL - T79

SP - 255

EP - 258

JO - Physica Scripta

JF - Physica Scripta

SN - 0031-8949

ER -