Characterization of wet chemistry resist and resist residues removal processes

Esa Muukkonen, Teija Häkkinen, Tarja Riihisaari, Simo Eränen, Ismo Luusua, Arto Kiviranta, Pekka Savolahti

    Research output: Contribution to journalArticleScientificpeer-review


    Light scattering measurement equipment was used in setting up a resist removal and cleaning process. The resist residue removal efficiency of the SCI bath after unsuccessful resist stripping was tested. Metal contamination loading was measured with Total reflection x-ray Fluorescence (TXRF) equipment. Chemical analysis methods and in situ monitoring were used to study aging of the bath.
    Original languageEnglish
    Pages (from-to)255-258
    Number of pages4
    JournalPhysica Scripta
    Publication statusPublished - 1999
    MoE publication typeA1 Journal article-refereed


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