Characterization of wet chemistry resist and resist residues removal processes

Esa Muukkonen; Teija Häkkinen; Tarja Riihisaari; Simo Eränen; Ismo Luusua; Arto Kiviranta; Pekka Savolahti

doi:10.1238/Physica.Topical.079a00255

Characterization of wet chemistry resist and resist residues removal processes

Esa Muukkonen, Teija Häkkinen, Tarja Riihisaari, Simo Eränen, Ismo Luusua, Arto Kiviranta, Pekka Savolahti

Research output: Contribution to journal › Article › Scientific › peer-review

Abstract

Light scattering measurement equipment was used in setting up a resist removal and cleaning process. The resist residue removal efficiency of the SCI bath after unsuccessful resist stripping was tested. Metal contamination loading was measured with Total reflection x-ray Fluorescence (TXRF) equipment. Chemical analysis methods and in situ monitoring were used to study aging of the bath.

Original language	English
Pages (from-to)	255-258
Number of pages	4
Journal	Physica Scripta
Volume	T79
DOIs	https://doi.org/10.1238/Physica.Topical.079a00255
Publication status	Published - 1999
MoE publication type	A1 Journal article-refereed

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10.1238/Physica.Topical.079a00255

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title = "Characterization of wet chemistry resist and resist residues removal processes",

abstract = "Light scattering measurement equipment was used in setting up a resist removal and cleaning process. The resist residue removal efficiency of the SCI bath after unsuccessful resist stripping was tested. Metal contamination loading was measured with Total reflection x-ray Fluorescence (TXRF) equipment. Chemical analysis methods and in situ monitoring were used to study aging of the bath.",

author = "Esa Muukkonen and Teija H{\"a}kkinen and Tarja Riihisaari and Simo Er{\"a}nen and Ismo Luusua and Arto Kiviranta and Pekka Savolahti",

year = "1999",

doi = "10.1238/Physica.Topical.079a00255",

language = "English",

volume = "T79",

pages = "255--258",

journal = "Physica Scripta",

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publisher = "Institute of Physics IOP",

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TY - JOUR

T1 - Characterization of wet chemistry resist and resist residues removal processes

AU - Muukkonen, Esa

AU - Häkkinen, Teija

AU - Riihisaari, Tarja

AU - Eränen, Simo

AU - Luusua, Ismo

AU - Kiviranta, Arto

AU - Savolahti, Pekka

PY - 1999

Y1 - 1999

N2 - Light scattering measurement equipment was used in setting up a resist removal and cleaning process. The resist residue removal efficiency of the SCI bath after unsuccessful resist stripping was tested. Metal contamination loading was measured with Total reflection x-ray Fluorescence (TXRF) equipment. Chemical analysis methods and in situ monitoring were used to study aging of the bath.

AB - Light scattering measurement equipment was used in setting up a resist removal and cleaning process. The resist residue removal efficiency of the SCI bath after unsuccessful resist stripping was tested. Metal contamination loading was measured with Total reflection x-ray Fluorescence (TXRF) equipment. Chemical analysis methods and in situ monitoring were used to study aging of the bath.

U2 - 10.1238/Physica.Topical.079a00255

DO - 10.1238/Physica.Topical.079a00255

M3 - Article

SN - 0281-1847

VL - T79

SP - 255

EP - 258

JO - Physica Scripta

JF - Physica Scripta

ER -

Characterization of wet chemistry resist and resist residues removal processes

Abstract

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