Light scattering measurement equipment was used in setting up a resist removal and cleaning process. The resist residue removal efficiency of the SCI bath after unsuccessful resist stripping was tested. Metal contamination loading was measured with Total reflection x-ray Fluorescence (TXRF) equipment. Chemical analysis methods and in situ monitoring were used to study aging of the bath.
Muukkonen, E., Häkkinen, T., Riihisaari, T., Eränen, S., Luusua, I., Kiviranta, A., & Savolahti, P. (1999). Characterization of wet chemistry resist and resist residues removal processes. Physica Scripta, T79, 255-258. https://doi.org/10.1238/Physica.Topical.079a00255