Comparative study of ALD SiO2 thin films for optical applications
- Kristin Pfeiffer
- , Svetlana Shestaeva
- , Astrid Bingel
- , Peter Munzert
- , Lilit Ghazaryan
- , Cristian van Helvoirt
- , Wilhelmus M.M. Kessels
- , Umut T. Sanli
- , Corinne Grévent
- , Gisela Schütz
- , Matti Putkonen
- , Iain Buchanan
- , Lars Jensen
- , Detlev Ristau
- , Andreas Tünnermann
- , Adriana Szeghalmi*
*Corresponding author for this work
- Friedrich Schiller University Jena
- Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V.
- Eindhoven University of Technology (TU/e)
- Max-Planck-Institut für Intelligente Systeme
- Air Products & Chemicals Inc.
- Laser Zentrum Hannover e.V. (LZH)
Research output: Contribution to journal › Article › Scientific › peer-review
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