Comparison of analytical methods for residue detection of resist removal processes

Tarja Riihisaari; Jari Likonen; Ari Kiviranta; S. Eränen; S. Lehto; Jarkko Tuominen; Timo Lindblom; Esa Muukkonen

doi:10.4028/www.scientific.net/SSP.65-66.215

Comparison of analytical methods for residue detection of resist removal processes

Tarja Riihisaari, Jari Likonen, Ari Kiviranta, S. Eränen, S. Lehto, Jarkko Tuominen, Timo Lindblom, Esa Muukkonen

Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review

2 Citations (Scopus)

Abstract

In integrated circuits fabrication photoresist layers are used as a pattern definition in etching and as a mask in ion implantation. Since photoresist layers are only used as an intermediate step and are not incorporated in the final structure, photoresist layers need to be thoroughly removed from the wafer surface. In this work we have evaluated the use of different on-line and off-line analytical methods for the detection of process residues of photoresist removal.

Original language	English
Title of host publication	Ultra Clean Processing of Silicon Surfaces IV
Editors	Marc Heyns, Marc Meuris, Paul Mertens
Publisher	Trans Tech Publications
Pages	215-218
ISBN (Electronic)	978-3-0357-0683-3, 978-3-03859-999-9
ISBN (Print)	978-3-908450-40-5
DOIs	https://doi.org/10.4028/www.scientific.net/SSP.65-66.215
Publication status	Published - 1998
MoE publication type	A4 Article in a conference publication
Event	4th International Symposium on Ultra Clean Processing of Silicon Surfaces, UCPSS 1998 - Ostend, Belgium Duration: 21 Sept 1998 → 23 Sept 1998

Publication series

Series	Solid State Phenomena
Volume	65-66
ISSN	1012-0394

Conference

Conference	4th International Symposium on Ultra Clean Processing of Silicon Surfaces, UCPSS 1998
Country/Territory	Belgium
City	Ostend
Period	21/09/98 → 23/09/98

Keywords

AFM
P and T-GC/MS
SIMS

Access to Document

10.4028/www.scientific.net/SSP.65-66.215

Cite this

Riihisaari, T., Likonen, J., Kiviranta, A., Eränen, S., Lehto, S., Tuominen, J., Lindblom, T., & Muukkonen, E. (1998). Comparison of analytical methods for residue detection of resist removal processes. In M. Heyns, M. Meuris, & P. Mertens (Eds.), Ultra Clean Processing of Silicon Surfaces IV (pp. 215-218). Trans Tech Publications. https://doi.org/10.4028/www.scientific.net/SSP.65-66.215

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title = "Comparison of analytical methods for residue detection of resist removal processes",

abstract = "In integrated circuits fabrication photoresist layers are used as a pattern definition in etching and as a mask in ion implantation. Since photoresist layers are only used as an intermediate step and are not incorporated in the final structure, photoresist layers need to be thoroughly removed from the wafer surface. In this work we have evaluated the use of different on-line and off-line analytical methods for the detection of process residues of photoresist removal.",

keywords = "AFM, P and T-GC/MS, SIMS",

author = "Tarja Riihisaari and Jari Likonen and Ari Kiviranta and S. Er{\"a}nen and S. Lehto and Jarkko Tuominen and Timo Lindblom and Esa Muukkonen",

year = "1998",

doi = "10.4028/www.scientific.net/SSP.65-66.215",

language = "English",

isbn = "978-3-908450-40-5",

series = "Solid State Phenomena",

publisher = "Trans Tech Publications",

pages = "215--218",

editor = "Marc Heyns and Marc Meuris and Paul Mertens",

booktitle = "Ultra Clean Processing of Silicon Surfaces IV",

address = "Switzerland",

note = "4th International Symposium on Ultra Clean Processing of Silicon Surfaces, UCPSS 1998 ; Conference date: 21-09-1998 Through 23-09-1998",

}

Riihisaari, T, Likonen, J, Kiviranta, A, Eränen, S, Lehto, S, Tuominen, J, Lindblom, T & Muukkonen, E 1998, Comparison of analytical methods for residue detection of resist removal processes. in M Heyns, M Meuris & P Mertens (eds), Ultra Clean Processing of Silicon Surfaces IV. Trans Tech Publications, Solid State Phenomena, vol. 65-66, pp. 215-218, 4th International Symposium on Ultra Clean Processing of Silicon Surfaces, UCPSS 1998, Ostend, Belgium, 21/09/98. https://doi.org/10.4028/www.scientific.net/SSP.65-66.215

Comparison of analytical methods for residue detection of resist removal processes. / Riihisaari, Tarja; Likonen, Jari; Kiviranta, Ari et al.
Ultra Clean Processing of Silicon Surfaces IV. ed. / Marc Heyns; Marc Meuris; Paul Mertens. Trans Tech Publications, 1998. p. 215-218 (Solid State Phenomena, Vol. 65-66).

Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review

TY - GEN

T1 - Comparison of analytical methods for residue detection of resist removal processes

AU - Riihisaari, Tarja

AU - Likonen, Jari

AU - Kiviranta, Ari

AU - Eränen, S.

AU - Lehto, S.

AU - Tuominen, Jarkko

AU - Lindblom, Timo

AU - Muukkonen, Esa

PY - 1998

Y1 - 1998

N2 - In integrated circuits fabrication photoresist layers are used as a pattern definition in etching and as a mask in ion implantation. Since photoresist layers are only used as an intermediate step and are not incorporated in the final structure, photoresist layers need to be thoroughly removed from the wafer surface. In this work we have evaluated the use of different on-line and off-line analytical methods for the detection of process residues of photoresist removal.

AB - In integrated circuits fabrication photoresist layers are used as a pattern definition in etching and as a mask in ion implantation. Since photoresist layers are only used as an intermediate step and are not incorporated in the final structure, photoresist layers need to be thoroughly removed from the wafer surface. In this work we have evaluated the use of different on-line and off-line analytical methods for the detection of process residues of photoresist removal.

KW - AFM

KW - P and T-GC/MS

KW - SIMS

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U2 - 10.4028/www.scientific.net/SSP.65-66.215

DO - 10.4028/www.scientific.net/SSP.65-66.215

M3 - Conference article in proceedings

SN - 978-3-908450-40-5

T3 - Solid State Phenomena

SP - 215

EP - 218

BT - Ultra Clean Processing of Silicon Surfaces IV

A2 - Heyns, Marc

A2 - Meuris, Marc

A2 - Mertens, Paul

PB - Trans Tech Publications

T2 - 4th International Symposium on Ultra Clean Processing of Silicon Surfaces, UCPSS 1998

Y2 - 21 September 1998 through 23 September 1998

ER -

Riihisaari T, Likonen J, Kiviranta A, Eränen S, Lehto S, Tuominen J et al. Comparison of analytical methods for residue detection of resist removal processes. In Heyns M, Meuris M, Mertens P, editors, Ultra Clean Processing of Silicon Surfaces IV. Trans Tech Publications. 1998. p. 215-218. (Solid State Phenomena, Vol. 65-66). doi: 10.4028/www.scientific.net/SSP.65-66.215

Comparison of analytical methods for residue detection of resist removal processes

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