Comparison of electronic effects and stress effects in enhancing regrowth rate of ion-implanted amorphous silicon
- C. Pai
- , Silvanus Lau
- , Ilkka Suni
- , Lazlo Csepregi
- University of California, San Diego
- Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V.
Research output: Contribution to journal › Article › Scientific › peer-review
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