Comparison of four QHR systems within one month using a temperature and pressure stabilized 100-Ohm resistor

A. Satrapinski, H. Seppä, B. Schumacher, P. Warnecke, F. Delahaye, W. Poirier, F. Piquemal

Research output: Contribution to journalArticleScientificpeer-review

4 Citations (Scopus)

Abstract

We have carried out a resistance comparison of four QHR systems using a 100-Ohm resistor in a temperature-controlled and hermetically sealed enclosure, the comparison was performed in November and December 1998, the participants were Bureau International des Poids et Mesures (BIPM), Bureau National de Metrology-Laboratoire Central des Industries Electroniques (BNM-LCIE) France, Physikalisch-Technische Bundesanstalt (PTB) Germany, and Valtion Teknillinen Tutkimuskeskus (VTT Automation) Finland, acting as a pilot laboratory. The comparison results agree within 3 parts in 109 with a relative combined standard uncertainty of ±1*10-8
Original languageEnglish
Pages (from-to)238-241
JournalIEEE Transactions on Instrumentation and Measurement
Volume50
Issue number2
DOIs
Publication statusPublished - 2002
MoE publication typeA1 Journal article-refereed

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Enclosures
resistors
Resistors
Automation
Industry
Finland
enclosure
automation
France
Germany
Temperature
metrology
temperature
industries
Uncertainty

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Satrapinski, A. ; Seppä, H. ; Schumacher, B. ; Warnecke, P. ; Delahaye, F. ; Poirier, W. ; Piquemal, F. / Comparison of four QHR systems within one month using a temperature and pressure stabilized 100-Ohm resistor. In: IEEE Transactions on Instrumentation and Measurement. 2002 ; Vol. 50, No. 2. pp. 238-241.
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Comparison of four QHR systems within one month using a temperature and pressure stabilized 100-Ohm resistor. / Satrapinski, A.; Seppä, H.; Schumacher, B.; Warnecke, P.; Delahaye, F.; Poirier, W.; Piquemal, F.

In: IEEE Transactions on Instrumentation and Measurement, Vol. 50, No. 2, 2002, p. 238-241.

Research output: Contribution to journalArticleScientificpeer-review

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AU - Delahaye, F.

AU - Poirier, W.

AU - Piquemal, F.

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