Computer simulations of collision cascade anisotropies and sputtering: Dissertation

Jari Likonen

    Research output: Thesis › Dissertation › Collection of Articles

    Abstract

    The binary collision lattice simulation code COSIPO has been used and developed further in order to investigate the sputtering of Cu atoms by Ar ions, collision cascade anisotropies, and the mechanisms behind these phenomena.The sputtering yields, angular distributions, energy distributions and space distributions of the original positions of the sputtered atoms have been calculated for various target structures.The effect of various model parameters in treating the binary collisions was studied.A combination of model parameters was found that relatively accurately reproduces experimental angular distributions and yields.A novel method to study collision cascade anisotropies and their relation to sputtering has been developed for the monocrystalline target.Calculations showed that the preferential ejection directions of sputtering are directly related to the anisotropies of cascade development.The contribution of collision sequence mechanisms to cascades and sputtering has been determined.The sensitivity of the angular distributions of the sputtered atoms on the near-surface structure and the Lehmann-Sigmund model have been studied by varying the thickness of a thin monocrystalline (amorphous) layer on top of the amorphous (monocrystalline) bulk.
    Original languageEnglish
    QualificationDoctor Degree
    Awarding Institution
    • University of Helsinki
    Supervisors/Advisors
    • Hautala, M., Supervisor, External person
    Award date17 Aug 1990
    Place of PublicationEspoo
    Publisher
    Print ISBNs951-38-3578-2
    Publication statusPublished - 1990
    MoE publication typeG5 Doctoral dissertation (article)

    Fingerprint

    cascades
    computerized simulation
    sputtering
    anisotropy
    collisions
    angular distribution
    atoms
    ejection
    energy distribution
    sensitivity
    ions
    simulation

    Keywords

    • computer simulation
    • binary collision approximation
    • collision cascade
    • anisotropies
    • sputtering

    Cite this

    Likonen, Jari. / Computer simulations of collision cascade anisotropies and sputtering : Dissertation. Espoo : VTT Technical Research Centre of Finland, 1990. 119 p.
    @phdthesis{3f010929d3794c3fb39fcf28929d7c15,
    title = "Computer simulations of collision cascade anisotropies and sputtering: Dissertation",
    abstract = "The binary collision lattice simulation code COSIPO has been used and developed further in order to investigate the sputtering of Cu atoms by Ar ions, collision cascade anisotropies, and the mechanisms behind these phenomena.The sputtering yields, angular distributions, energy distributions and space distributions of the original positions of the sputtered atoms have been calculated for various target structures.The effect of various model parameters in treating the binary collisions was studied.A combination of model parameters was found that relatively accurately reproduces experimental angular distributions and yields.A novel method to study collision cascade anisotropies and their relation to sputtering has been developed for the monocrystalline target.Calculations showed that the preferential ejection directions of sputtering are directly related to the anisotropies of cascade development.The contribution of collision sequence mechanisms to cascades and sputtering has been determined.The sensitivity of the angular distributions of the sputtered atoms on the near-surface structure and the Lehmann-Sigmund model have been studied by varying the thickness of a thin monocrystalline (amorphous) layer on top of the amorphous (monocrystalline) bulk.",
    keywords = "computer simulation, binary collision approximation, collision cascade, anisotropies, sputtering",
    author = "Jari Likonen",
    year = "1990",
    language = "English",
    isbn = "951-38-3578-2",
    series = "Technical Research Centre of Finland. Publications",
    publisher = "VTT Technical Research Centre of Finland",
    number = "65",
    address = "Finland",
    school = "University of Helsinki",

    }

    Likonen, J 1990, 'Computer simulations of collision cascade anisotropies and sputtering: Dissertation', Doctor Degree, University of Helsinki, Espoo.

    Computer simulations of collision cascade anisotropies and sputtering : Dissertation. / Likonen, Jari.

    Espoo : VTT Technical Research Centre of Finland, 1990. 119 p.

    Research output: Thesis › Dissertation › Collection of Articles

    TY - THES

    T1 - Computer simulations of collision cascade anisotropies and sputtering

    T2 - Dissertation

    AU - Likonen, Jari

    PY - 1990

    Y1 - 1990

    N2 - The binary collision lattice simulation code COSIPO has been used and developed further in order to investigate the sputtering of Cu atoms by Ar ions, collision cascade anisotropies, and the mechanisms behind these phenomena.The sputtering yields, angular distributions, energy distributions and space distributions of the original positions of the sputtered atoms have been calculated for various target structures.The effect of various model parameters in treating the binary collisions was studied.A combination of model parameters was found that relatively accurately reproduces experimental angular distributions and yields.A novel method to study collision cascade anisotropies and their relation to sputtering has been developed for the monocrystalline target.Calculations showed that the preferential ejection directions of sputtering are directly related to the anisotropies of cascade development.The contribution of collision sequence mechanisms to cascades and sputtering has been determined.The sensitivity of the angular distributions of the sputtered atoms on the near-surface structure and the Lehmann-Sigmund model have been studied by varying the thickness of a thin monocrystalline (amorphous) layer on top of the amorphous (monocrystalline) bulk.

    AB - The binary collision lattice simulation code COSIPO has been used and developed further in order to investigate the sputtering of Cu atoms by Ar ions, collision cascade anisotropies, and the mechanisms behind these phenomena.The sputtering yields, angular distributions, energy distributions and space distributions of the original positions of the sputtered atoms have been calculated for various target structures.The effect of various model parameters in treating the binary collisions was studied.A combination of model parameters was found that relatively accurately reproduces experimental angular distributions and yields.A novel method to study collision cascade anisotropies and their relation to sputtering has been developed for the monocrystalline target.Calculations showed that the preferential ejection directions of sputtering are directly related to the anisotropies of cascade development.The contribution of collision sequence mechanisms to cascades and sputtering has been determined.The sensitivity of the angular distributions of the sputtered atoms on the near-surface structure and the Lehmann-Sigmund model have been studied by varying the thickness of a thin monocrystalline (amorphous) layer on top of the amorphous (monocrystalline) bulk.

    KW - computer simulation

    KW - binary collision approximation

    KW - collision cascade

    KW - anisotropies

    KW - sputtering

    M3 - Dissertation

    SN - 951-38-3578-2

    T3 - Technical Research Centre of Finland. Publications

    PB - VTT Technical Research Centre of Finland

    CY - Espoo

    ER -

    Likonen J. Computer simulations of collision cascade anisotropies and sputtering: Dissertation. Espoo: VTT Technical Research Centre of Finland, 1990. 119 p.