Abstract
| Original language | English |
|---|---|
| Qualification | Doctor Degree |
| Awarding Institution |
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| Supervisors/Advisors |
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| Award date | 17 Aug 1990 |
| Place of Publication | Espoo |
| Publisher | |
| Print ISBNs | 951-38-3578-2 |
| Publication status | Published - 1990 |
| MoE publication type | G5 Doctoral dissertation (article) |
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Keywords
- computer simulation
- binary collision approximation
- collision cascade
- anisotropies
- sputtering
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Computer simulations of collision cascade anisotropies and sputtering : Dissertation. / Likonen, Jari.
Espoo : VTT Technical Research Centre of Finland, 1990. 119 p.Research output: Thesis › Dissertation
TY - THES
T1 - Computer simulations of collision cascade anisotropies and sputtering
T2 - Dissertation
AU - Likonen, Jari
PY - 1990
Y1 - 1990
N2 - The binary collision lattice simulation code COSIPO has been used and developed further in order to investigate the sputtering of Cu atoms by Ar ions, collision cascade anisotropies, and the mechanisms behind these phenomena.The sputtering yields, angular distributions, energy distributions and space distributions of the original positions of the sputtered atoms have been calculated for various target structures.The effect of various model parameters in treating the binary collisions was studied.A combination of model parameters was found that relatively accurately reproduces experimental angular distributions and yields.A novel method to study collision cascade anisotropies and their relation to sputtering has been developed for the monocrystalline target.Calculations showed that the preferential ejection directions of sputtering are directly related to the anisotropies of cascade development.The contribution of collision sequence mechanisms to cascades and sputtering has been determined.The sensitivity of the angular distributions of the sputtered atoms on the near-surface structure and the Lehmann-Sigmund model have been studied by varying the thickness of a thin monocrystalline (amorphous) layer on top of the amorphous (monocrystalline) bulk.
AB - The binary collision lattice simulation code COSIPO has been used and developed further in order to investigate the sputtering of Cu atoms by Ar ions, collision cascade anisotropies, and the mechanisms behind these phenomena.The sputtering yields, angular distributions, energy distributions and space distributions of the original positions of the sputtered atoms have been calculated for various target structures.The effect of various model parameters in treating the binary collisions was studied.A combination of model parameters was found that relatively accurately reproduces experimental angular distributions and yields.A novel method to study collision cascade anisotropies and their relation to sputtering has been developed for the monocrystalline target.Calculations showed that the preferential ejection directions of sputtering are directly related to the anisotropies of cascade development.The contribution of collision sequence mechanisms to cascades and sputtering has been determined.The sensitivity of the angular distributions of the sputtered atoms on the near-surface structure and the Lehmann-Sigmund model have been studied by varying the thickness of a thin monocrystalline (amorphous) layer on top of the amorphous (monocrystalline) bulk.
KW - computer simulation
KW - binary collision approximation
KW - collision cascade
KW - anisotropies
KW - sputtering
M3 - Dissertation
SN - 951-38-3578-2
T3 - Technical Research Centre of Finland. Publications
PB - VTT Technical Research Centre of Finland
CY - Espoo
ER -