The article describes methods, that can be used to concentrate ultra pure water for the detection of metallic trace impurities. A few possibilities for the concentration step are discussed. A new alternative, namely the vaporization on a silicon wafer combined with the vapor phase decomposition (VPD) technique is found to be a suitable candidate. The analysis of metallic impurities with the total reflection X-ray fluoresence (TXRF) and graphite furnace atomic absorption spectroscopy (GF-AAS) is shown to be extendable well into the sub-ppt regime.
|Publication status||Published - 2002|
|MoE publication type||A1 Journal article-refereed|
|Event||19th Nordic Semiconductor Meeting, NSM19|
- Copenhagen, Denmark
Duration: 20 May 2001 → 23 May 2001