Concentration methods for the detection of trace elements in UPW

Simo Eränen (Corresponding Author), Heini Saloniemi, J. Hintsala, Ismo Luusua

    Research output: Contribution to journalArticleScientificpeer-review


    The article describes methods, that can be used to concentrate ultra pure water for the detection of metallic trace impurities. A few possibilities for the concentration step are discussed. A new alternative, namely the vaporization on a silicon wafer combined with the vapor phase decomposition (VPD) technique is found to be a suitable candidate. The analysis of metallic impurities with the total reflection X-ray fluoresence (TXRF) and graphite furnace atomic absorption spectroscopy (GF-AAS) is shown to be extendable well into the sub-ppt regime.
    Original languageEnglish
    Pages (from-to)196-199
    JournalPhysica Scripta
    Issue numberT101
    Publication statusPublished - 2002
    MoE publication typeA1 Journal article-refereed
    Event19th Nordic Semiconductor Meeting, NSM19
    - Copenhagen, Denmark
    Duration: 20 May 200123 May 2001


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