Concentration methods for the detection of trace elements in UPW

Simo Eränen (Corresponding Author), Heini Saloniemi, J. Hintsala, Ismo Luusua

Research output: Contribution to journalArticleScientificpeer-review

Abstract

The article describes methods, that can be used to concentrate ultra pure water for the detection of metallic trace impurities. A few possibilities for the concentration step are discussed. A new alternative, namely the vaporization on a silicon wafer combined with the vapor phase decomposition (VPD) technique is found to be a suitable candidate. The analysis of metallic impurities with the total reflection X-ray fluoresence (TXRF) and graphite furnace atomic absorption spectroscopy (GF-AAS) is shown to be extendable well into the sub-ppt regime.
Original languageEnglish
Pages (from-to)196-199
JournalPhysica Scripta
Volume2002
Issue numberT101
DOIs
Publication statusPublished - 2002
MoE publication typeA1 Journal article-refereed

Fingerprint

Impurities
trace elements
Trace
impurities
Absorption Spectroscopy
Graphite
Decomposition Techniques
Furnace
Wafer
furnaces
Silicon
absorption spectroscopy
graphite
wafers
vapor phases
Water
decomposition
Alternatives
silicon
water

Cite this

Eränen, Simo ; Saloniemi, Heini ; Hintsala, J. ; Luusua, Ismo. / Concentration methods for the detection of trace elements in UPW. In: Physica Scripta. 2002 ; Vol. 2002, No. T101. pp. 196-199.
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Concentration methods for the detection of trace elements in UPW. / Eränen, Simo (Corresponding Author); Saloniemi, Heini; Hintsala, J.; Luusua, Ismo.

In: Physica Scripta, Vol. 2002, No. T101, 2002, p. 196-199.

Research output: Contribution to journalArticleScientificpeer-review

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AU - Hintsala, J.

AU - Luusua, Ismo

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AB - The article describes methods, that can be used to concentrate ultra pure water for the detection of metallic trace impurities. A few possibilities for the concentration step are discussed. A new alternative, namely the vaporization on a silicon wafer combined with the vapor phase decomposition (VPD) technique is found to be a suitable candidate. The analysis of metallic impurities with the total reflection X-ray fluoresence (TXRF) and graphite furnace atomic absorption spectroscopy (GF-AAS) is shown to be extendable well into the sub-ppt regime.

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JF - Physica Scripta

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