Abstract
The article describes methods, that can be used to concentrate ultra pure water for the detection of metallic trace impurities. A few possibilities for the concentration step are discussed. A new alternative, namely the vaporization on a silicon wafer combined with the vapor phase decomposition (VPD) technique is found to be a suitable candidate. The analysis of metallic impurities with the total reflection X-ray fluoresence (TXRF) and graphite furnace atomic absorption spectroscopy (GF-AAS) is shown to be extendable well into the sub-ppt regime.
| Original language | English |
|---|---|
| Pages (from-to) | 196-199 |
| Journal | Physica Scripta |
| Volume | 2002 |
| Issue number | T101 |
| DOIs | |
| Publication status | Published - 2002 |
| MoE publication type | A1 Journal article-refereed |
| Event | 19th Nordic Semiconductor Meeting, NSM19 - Copenhagen, Denmark Duration: 20 May 2001 → 23 May 2001 |