Conformality analysis of the archetype aluminium oxide ALD process in 3rd-generation silicon-based lateral high-aspect-ratio test structures

Oili M.E. Ylivaara, Jihong Yim, Markku Ylilammi, Mikko Utriainen, Riikka, L. Puurunen

Research output: Contribution to conferenceConference PosterScientificpeer-review

Original languageEnglish
Publication statusPublished - 27 Jun 2019
MoE publication typeNot Eligible
EventJoint EuroCVD 22 - Baltic ALD 16 conference 2019 - Luxembourg, Luxembourg
Duration: 24 Jun 201928 Jun 2019
https://www.eurocvd-balticald2019.lu

Conference

ConferenceJoint EuroCVD 22 - Baltic ALD 16 conference 2019
CountryLuxembourg
Period24/06/1928/06/19
Internet address

Keywords

  • OtaNano

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