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Conformality analysis of the archetype aluminium oxide ALD process in 3rd-generation silicon-based lateral high-aspect-ratio test structures
- Oili M.E. Ylivaara
- , Jihong Yim
- , Markku Ylilammi
- , Mikko Utriainen
- , Riikka, L. Puurunen
Research output: Contribution to conference › Conference Poster › Scientific › peer-review