Conformality analysis of the archetype aluminium oxide ALD process in 3rd-generation silicon-based lateral high-aspect-ratio test structures

Oili M.E. Ylivaara, Jihong Yim, Markku Ylilammi, Mikko Utriainen, Riikka, L. Puurunen

Research output: Contribution to conference › Conference Poster › Scientific › peer-review

Equipment