INIS
aspect ratio
100%
deposition
100%
depth
57%
values
42%
layers
42%
thickness
42%
growth
42%
doses
42%
films
42%
reactors
42%
half-thickness
42%
comparative evaluations
28%
diffusion length
28%
height
14%
pulses
14%
water
14%
precursor
14%
increasing
14%
volume
14%
aluminium oxides
14%
thin films
14%
ozone
14%
manufacturing
14%
cavities
14%
precision
14%
curves
14%
reaction kinetics
14%
hydroxides
14%
Engineering
Conformality
100%
High Aspect Ratio
100%
Reactant
75%
Atomic Layer Deposition
75%
Deposition Condition
50%
Aluminum Oxide (al2o3)
25%
Test Structure
25%
Parameter Set
25%
Main Difference
25%
Modern Manufacturing
25%
Nanometre
25%
Deposited Film
25%
Deposition Parameter
25%
Ozone (O3)
25%
Thin Films
25%
Kinetic Parameter
25%
Deposition Process
25%
Profile Curve
25%
Aspect Ratio
25%
Keyphrases
Conformality
100%
Trimethylaluminum
100%
High Aspect Ratio Structure
100%
Atomic Layer Deposition
15%
Reactor
15%
Growth per Cycle
15%
Thickness Profile
15%
Sticking Coefficient
10%
Deposition Conditions
10%
Diffusion Length
10%
Coreactant
10%
Al2O3 Oxide
5%
Fast-growing
5%
High Dose
5%
Hydroxyl Group
5%
Aspect Ratio
5%
Deposition Process
5%
Reaction Kinetics Parameters
5%
Deposited Film
5%
Reflectance Spectroscopy
5%
Cross-sectional Area
5%
Deposition Parameters
5%
Steep Slope
5%
Nanometer Resolution
5%
Low Depth
5%
Savannah
5%
Profile Curve
5%
High Aspect Ratio Cavities
5%
Gap Height
5%
S200
5%
Growing Techniques
5%
Conformal Thin Film
5%
Chemical Engineering
Film
100%
Atomic Layer Deposition
75%