Abstract
Roll-to-roll nanoimprint lithography (rrNIL) process, in
which a patterned roll is used to transfer features with
nanometer resolution, has been proposed. In rrNIL process
the parameters that affect the imprinting results are
pressure, temperature and imprinting. In the roll-to-roll
process the printing speed is typically from a few
centimetres per minute up to tens of meters per minute,
indicating that the imprint time is very short when
compared to planar NIL.
High speed rrNIL manufacturing has high potential for
future applications exploiting nanoscale features
and structures. This has been already demonstrated by
transferring 100 nm patterns at speed of 20 m/min. On the
other hand, the speed falls well behind the speeds used
in today's paper industry. The limitations in NIL
processes arise from the time needed to mould the
polymer.
Original language | English |
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Title of host publication | Advanced Technologies and Applications of Nanoimprint |
Editors | Hirai Yoshihiko |
Place of Publication | Tokyo |
Pages | 61-66 |
Publication status | Published - 2008 |
MoE publication type | A3 Part of a book or another research book |