Corrosion resistance of N-, Cr- or Cr + N - implanted AISI 420

Juha-Pekka Hirvonen, Dorothee Ruck, S. Yan, Amar Mahiout, Pauli Torri, Jari Likonen

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Abstract

AISI 420 stainless steel samples with a diameter of 25 mm were implanted with nitrogen, with chromium or with chromium and nitrogen.
The implantation energy and nominal fluence for Cr were 230 keV and 2 × 1017 ions cm−2, and those for N were 50 keV and 2.5 × 1017 ions cm−2 respectively. In nitrogen implantations, 15N isotopes were used in order to perform a depth profiling utilizing a resonance of the 15N(p,αγ)12C reaction.
For all three samples and an unimplanted reference sample, anodic polarization diagrams were determined in 1 N H2SO4 solution. The unimplanted sample showed an active peak and a passivation behavior. Chromium implantation decreased the peak current density, but both in the case of the chromium implanted sample and the nitrogen implanted sample, passivation characteristics were unchanged. In the case of the sample implanted with chromium and nitrogen the measured anodic polarization curve exhibited a totally different behavior.
The active peak had almost completely disappeared (a reduction of four orders of the magnitude in current density compared with that of the unimplanted sample) and the passivation current density was also greatly decreased.
Secondary-ion mass spectroscopy was utilized in analyzing surface films, which revealed a complex structure of a passive layer in the case of the sample implanted with both chromium and nitrogen.
Original languageEnglish
Pages (from-to)760-764
JournalSurface and Coatings Technology
Volume74-75
Issue numberPart 2
DOIs
Publication statusPublished - 1995
MoE publication typeA1 Journal article-refereed

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Chromium
corrosion resistance
Corrosion resistance
Nitrogen
chromium
Passivation
nitrogen
Current density
Anodic polarization
Ions
passivity
implantation
current density
Depth profiling
Stainless Steel
Isotopes
Ion implantation
ions
Stainless steel
Spectroscopy

Cite this

Hirvonen, Juha-Pekka ; Ruck, Dorothee ; Yan, S. ; Mahiout, Amar ; Torri, Pauli ; Likonen, Jari. / Corrosion resistance of N-, Cr- or Cr + N - implanted AISI 420. In: Surface and Coatings Technology. 1995 ; Vol. 74-75, No. Part 2. pp. 760-764.
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title = "Corrosion resistance of N-, Cr- or Cr + N - implanted AISI 420",
abstract = "AISI 420 stainless steel samples with a diameter of 25 mm were implanted with nitrogen, with chromium or with chromium and nitrogen. The implantation energy and nominal fluence for Cr were 230 keV and 2 × 1017 ions cm−2, and those for N were 50 keV and 2.5 × 1017 ions cm−2 respectively. In nitrogen implantations, 15N isotopes were used in order to perform a depth profiling utilizing a resonance of the 15N(p,αγ)12C reaction. For all three samples and an unimplanted reference sample, anodic polarization diagrams were determined in 1 N H2SO4 solution. The unimplanted sample showed an active peak and a passivation behavior. Chromium implantation decreased the peak current density, but both in the case of the chromium implanted sample and the nitrogen implanted sample, passivation characteristics were unchanged. In the case of the sample implanted with chromium and nitrogen the measured anodic polarization curve exhibited a totally different behavior. The active peak had almost completely disappeared (a reduction of four orders of the magnitude in current density compared with that of the unimplanted sample) and the passivation current density was also greatly decreased. Secondary-ion mass spectroscopy was utilized in analyzing surface films, which revealed a complex structure of a passive layer in the case of the sample implanted with both chromium and nitrogen.",
author = "Juha-Pekka Hirvonen and Dorothee Ruck and S. Yan and Amar Mahiout and Pauli Torri and Jari Likonen",
year = "1995",
doi = "10.1016/0257-8972(95)08273-5",
language = "English",
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Hirvonen, J-P, Ruck, D, Yan, S, Mahiout, A, Torri, P & Likonen, J 1995, 'Corrosion resistance of N-, Cr- or Cr + N - implanted AISI 420', Surface and Coatings Technology, vol. 74-75, no. Part 2, pp. 760-764. https://doi.org/10.1016/0257-8972(95)08273-5

Corrosion resistance of N-, Cr- or Cr + N - implanted AISI 420. / Hirvonen, Juha-Pekka; Ruck, Dorothee; Yan, S.; Mahiout, Amar; Torri, Pauli; Likonen, Jari.

In: Surface and Coatings Technology, Vol. 74-75, No. Part 2, 1995, p. 760-764.

Research output: Contribution to journalArticleScientificpeer-review

TY - JOUR

T1 - Corrosion resistance of N-, Cr- or Cr + N - implanted AISI 420

AU - Hirvonen, Juha-Pekka

AU - Ruck, Dorothee

AU - Yan, S.

AU - Mahiout, Amar

AU - Torri, Pauli

AU - Likonen, Jari

PY - 1995

Y1 - 1995

N2 - AISI 420 stainless steel samples with a diameter of 25 mm were implanted with nitrogen, with chromium or with chromium and nitrogen. The implantation energy and nominal fluence for Cr were 230 keV and 2 × 1017 ions cm−2, and those for N were 50 keV and 2.5 × 1017 ions cm−2 respectively. In nitrogen implantations, 15N isotopes were used in order to perform a depth profiling utilizing a resonance of the 15N(p,αγ)12C reaction. For all three samples and an unimplanted reference sample, anodic polarization diagrams were determined in 1 N H2SO4 solution. The unimplanted sample showed an active peak and a passivation behavior. Chromium implantation decreased the peak current density, but both in the case of the chromium implanted sample and the nitrogen implanted sample, passivation characteristics were unchanged. In the case of the sample implanted with chromium and nitrogen the measured anodic polarization curve exhibited a totally different behavior. The active peak had almost completely disappeared (a reduction of four orders of the magnitude in current density compared with that of the unimplanted sample) and the passivation current density was also greatly decreased. Secondary-ion mass spectroscopy was utilized in analyzing surface films, which revealed a complex structure of a passive layer in the case of the sample implanted with both chromium and nitrogen.

AB - AISI 420 stainless steel samples with a diameter of 25 mm were implanted with nitrogen, with chromium or with chromium and nitrogen. The implantation energy and nominal fluence for Cr were 230 keV and 2 × 1017 ions cm−2, and those for N were 50 keV and 2.5 × 1017 ions cm−2 respectively. In nitrogen implantations, 15N isotopes were used in order to perform a depth profiling utilizing a resonance of the 15N(p,αγ)12C reaction. For all three samples and an unimplanted reference sample, anodic polarization diagrams were determined in 1 N H2SO4 solution. The unimplanted sample showed an active peak and a passivation behavior. Chromium implantation decreased the peak current density, but both in the case of the chromium implanted sample and the nitrogen implanted sample, passivation characteristics were unchanged. In the case of the sample implanted with chromium and nitrogen the measured anodic polarization curve exhibited a totally different behavior. The active peak had almost completely disappeared (a reduction of four orders of the magnitude in current density compared with that of the unimplanted sample) and the passivation current density was also greatly decreased. Secondary-ion mass spectroscopy was utilized in analyzing surface films, which revealed a complex structure of a passive layer in the case of the sample implanted with both chromium and nitrogen.

U2 - 10.1016/0257-8972(95)08273-5

DO - 10.1016/0257-8972(95)08273-5

M3 - Article

VL - 74-75

SP - 760

EP - 764

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

SN - 0257-8972

IS - Part 2

ER -