Coupling layer composition for a semiconductor device, semiconductor device, method of forming the coupling layer, and apparatus for the manufacture of a semiconductor device

  • Philippe Monnoyer (Inventor)
  • , Maria Luisa Calvo-Munoz (Inventor)
  • , Janos Farkas (Inventor)
  • , Sabine Szunerits (Inventor)

Research output: PatentPatent application

Abstract

Molecules of a coupling layer composition in a semiconductor device are bidimensionally polymerized in order to provide enhanced moisture blocking effect, particularly when the coupling layer is formed on a porous layer, such as a porous dielectric layer. The deposition of the coupling layer on the underlying structure and/or the cross-polymerization of the coupling layer composition and/or a final metallization can be photo-activated, especially, but not only, using an ultraviolet light.
Original languageEnglish
Patent numberUS20100200995A1
IPCPCT/B07/S3437
Filing date9/07/07
Publication statusPublished - 12 Aug 2010
MoE publication typeNot Eligible

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