Crystallization and oxidation behaviour of Mo-Si-N coatings

Juha-Pekka Hirvonen, Ilkka Suni, Hannu Kattelus, Reijo Lappalainen, Pauli Torri, Harriet Kung, Tom Jervis, Michael Nastasi, J. Tesmer

Research output: Contribution to journalArticleScientificpeer-review

16 Citations (Scopus)

Abstract

Mo-Si-N coatings with different nitrogen concentrations were produced by nitrogen alloying simultaneously during sputter deposition from a planar magnetron MoSi2 target with nitrogen plasma onto steel substrates.
The ratio of molybdenum and silicon concentrations was 0.5. The nitrogen concentrations of the samples were 20, 35, and 50 at.% and the concentration profile was uniform througout the film thickness. The initial microstructure at all nitrogen concentrations involved was amorphous and the crystallization temperature was strongly dependent on nitrogen concentration. The sample with 50 at.% N was still amorphous after annealing at 1000°C whereas the sample with 35 at.% N was crystallized at 740-760°C and the sample with 20 at.% N at 660-680°C. Even this was higher than the crystallization temperature of a pure MoSi2 coating, about 500°C.
The oxidation behavior of the Mo-Si-N coatings with 50 at.% N was determined in wet oxidation conditions from 400 to 1000°C by measuring oxygen concentration on the surface using a nuclear reaction 16O(d,p)17O or non-Rutherford scattering of He+. The excellent oxidation resistance of this coating on low carbon steel was confirmed up to 800°C, above which diffusion of nitrogen occurred, resulting in crystallization and degrading of the beneficial properties.
The oxidation behavior of the Mo-Si-N coating can be explained in terms of amorphous microstructure and silicon-nitrogen interaction.

Original languageEnglish
Pages (from-to)981-985
JournalSurface and Coatings Technology
Volume74-75
Issue numberPart 2
DOIs
Publication statusPublished - 1995
MoE publication typeA1 Journal article-refereed

Fingerprint

Crystallization
Nitrogen
crystallization
coatings
nitrogen
Coatings
Oxidation
oxidation
Silicon
Nitrogen plasma
microstructure
Sputter deposition
Microstructure
low carbon steels
nitrogen plasma
Molybdenum
Nuclear reactions
oxidation resistance
Steel
Oxidation resistance

Cite this

Hirvonen, J-P., Suni, I., Kattelus, H., Lappalainen, R., Torri, P., Kung, H., ... Tesmer, J. (1995). Crystallization and oxidation behaviour of Mo-Si-N coatings. Surface and Coatings Technology, 74-75(Part 2), 981-985. https://doi.org/10.1016/0257-8972(95)08327-8
Hirvonen, Juha-Pekka ; Suni, Ilkka ; Kattelus, Hannu ; Lappalainen, Reijo ; Torri, Pauli ; Kung, Harriet ; Jervis, Tom ; Nastasi, Michael ; Tesmer, J. / Crystallization and oxidation behaviour of Mo-Si-N coatings. In: Surface and Coatings Technology. 1995 ; Vol. 74-75, No. Part 2. pp. 981-985.
@article{64269c324be94a96907e90d03f0b498f,
title = "Crystallization and oxidation behaviour of Mo-Si-N coatings",
abstract = "Mo-Si-N coatings with different nitrogen concentrations were produced by nitrogen alloying simultaneously during sputter deposition from a planar magnetron MoSi2 target with nitrogen plasma onto steel substrates. The ratio of molybdenum and silicon concentrations was 0.5. The nitrogen concentrations of the samples were 20, 35, and 50 at.{\%} and the concentration profile was uniform througout the film thickness. The initial microstructure at all nitrogen concentrations involved was amorphous and the crystallization temperature was strongly dependent on nitrogen concentration. The sample with 50 at.{\%} N was still amorphous after annealing at 1000°C whereas the sample with 35 at.{\%} N was crystallized at 740-760°C and the sample with 20 at.{\%} N at 660-680°C. Even this was higher than the crystallization temperature of a pure MoSi2 coating, about 500°C. The oxidation behavior of the Mo-Si-N coatings with 50 at.{\%} N was determined in wet oxidation conditions from 400 to 1000°C by measuring oxygen concentration on the surface using a nuclear reaction 16O(d,p)17O or non-Rutherford scattering of He+. The excellent oxidation resistance of this coating on low carbon steel was confirmed up to 800°C, above which diffusion of nitrogen occurred, resulting in crystallization and degrading of the beneficial properties. The oxidation behavior of the Mo-Si-N coating can be explained in terms of amorphous microstructure and silicon-nitrogen interaction.",
author = "Juha-Pekka Hirvonen and Ilkka Suni and Hannu Kattelus and Reijo Lappalainen and Pauli Torri and Harriet Kung and Tom Jervis and Michael Nastasi and J. Tesmer",
year = "1995",
doi = "10.1016/0257-8972(95)08327-8",
language = "English",
volume = "74-75",
pages = "981--985",
journal = "Surface and Coatings Technology",
issn = "0257-8972",
publisher = "Elsevier",
number = "Part 2",

}

Hirvonen, J-P, Suni, I, Kattelus, H, Lappalainen, R, Torri, P, Kung, H, Jervis, T, Nastasi, M & Tesmer, J 1995, 'Crystallization and oxidation behaviour of Mo-Si-N coatings', Surface and Coatings Technology, vol. 74-75, no. Part 2, pp. 981-985. https://doi.org/10.1016/0257-8972(95)08327-8

Crystallization and oxidation behaviour of Mo-Si-N coatings. / Hirvonen, Juha-Pekka; Suni, Ilkka; Kattelus, Hannu; Lappalainen, Reijo; Torri, Pauli; Kung, Harriet; Jervis, Tom; Nastasi, Michael; Tesmer, J.

In: Surface and Coatings Technology, Vol. 74-75, No. Part 2, 1995, p. 981-985.

Research output: Contribution to journalArticleScientificpeer-review

TY - JOUR

T1 - Crystallization and oxidation behaviour of Mo-Si-N coatings

AU - Hirvonen, Juha-Pekka

AU - Suni, Ilkka

AU - Kattelus, Hannu

AU - Lappalainen, Reijo

AU - Torri, Pauli

AU - Kung, Harriet

AU - Jervis, Tom

AU - Nastasi, Michael

AU - Tesmer, J.

PY - 1995

Y1 - 1995

N2 - Mo-Si-N coatings with different nitrogen concentrations were produced by nitrogen alloying simultaneously during sputter deposition from a planar magnetron MoSi2 target with nitrogen plasma onto steel substrates. The ratio of molybdenum and silicon concentrations was 0.5. The nitrogen concentrations of the samples were 20, 35, and 50 at.% and the concentration profile was uniform througout the film thickness. The initial microstructure at all nitrogen concentrations involved was amorphous and the crystallization temperature was strongly dependent on nitrogen concentration. The sample with 50 at.% N was still amorphous after annealing at 1000°C whereas the sample with 35 at.% N was crystallized at 740-760°C and the sample with 20 at.% N at 660-680°C. Even this was higher than the crystallization temperature of a pure MoSi2 coating, about 500°C. The oxidation behavior of the Mo-Si-N coatings with 50 at.% N was determined in wet oxidation conditions from 400 to 1000°C by measuring oxygen concentration on the surface using a nuclear reaction 16O(d,p)17O or non-Rutherford scattering of He+. The excellent oxidation resistance of this coating on low carbon steel was confirmed up to 800°C, above which diffusion of nitrogen occurred, resulting in crystallization and degrading of the beneficial properties. The oxidation behavior of the Mo-Si-N coating can be explained in terms of amorphous microstructure and silicon-nitrogen interaction.

AB - Mo-Si-N coatings with different nitrogen concentrations were produced by nitrogen alloying simultaneously during sputter deposition from a planar magnetron MoSi2 target with nitrogen plasma onto steel substrates. The ratio of molybdenum and silicon concentrations was 0.5. The nitrogen concentrations of the samples were 20, 35, and 50 at.% and the concentration profile was uniform througout the film thickness. The initial microstructure at all nitrogen concentrations involved was amorphous and the crystallization temperature was strongly dependent on nitrogen concentration. The sample with 50 at.% N was still amorphous after annealing at 1000°C whereas the sample with 35 at.% N was crystallized at 740-760°C and the sample with 20 at.% N at 660-680°C. Even this was higher than the crystallization temperature of a pure MoSi2 coating, about 500°C. The oxidation behavior of the Mo-Si-N coatings with 50 at.% N was determined in wet oxidation conditions from 400 to 1000°C by measuring oxygen concentration on the surface using a nuclear reaction 16O(d,p)17O or non-Rutherford scattering of He+. The excellent oxidation resistance of this coating on low carbon steel was confirmed up to 800°C, above which diffusion of nitrogen occurred, resulting in crystallization and degrading of the beneficial properties. The oxidation behavior of the Mo-Si-N coating can be explained in terms of amorphous microstructure and silicon-nitrogen interaction.

U2 - 10.1016/0257-8972(95)08327-8

DO - 10.1016/0257-8972(95)08327-8

M3 - Article

VL - 74-75

SP - 981

EP - 985

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

SN - 0257-8972

IS - Part 2

ER -

Hirvonen J-P, Suni I, Kattelus H, Lappalainen R, Torri P, Kung H et al. Crystallization and oxidation behaviour of Mo-Si-N coatings. Surface and Coatings Technology. 1995;74-75(Part 2):981-985. https://doi.org/10.1016/0257-8972(95)08327-8