Deep reactive ion etching

Franz Laermer, Sami Franssila, Lauri Sainiemi, Kai Kolari

Research output: Chapter in Book/Report/Conference proceedingChapter or book articleScientificpeer-review

13 Citations (Scopus)
Original languageEnglish
Title of host publicationHandbook of Silicon Based MEMS Materials & Technologies
EditorsVeikko Lindroos, Markku Tilli, Ari Lehto, Teruaki Motooka
Place of PublicationNorwich, NY, USA
Chapter23
Pages349-374
DOIs
Publication statusPublished - 2010
MoE publication typeA3 Part of a book or another research book

Cite this

Laermer, F., Franssila, S., Sainiemi, L., & Kolari, K. (2010). Deep reactive ion etching. In V. Lindroos, M. Tilli, A. Lehto, & T. Motooka (Eds.), Handbook of Silicon Based MEMS Materials & Technologies (pp. 349-374). https://doi.org/10.1016/B978-0-8155-1594-4.00023-1