Deep reactive ion etching

Franz Laermer, Sami Franssila, Lauri Sainiemi, Kai Kolari

Research output: Chapter in Book/Report/Conference proceedingChapter or book articleScientificpeer-review

13 Citations (Scopus)
Original languageEnglish
Title of host publicationHandbook of Silicon Based MEMS Materials & Technologies
EditorsVeikko Lindroos, Markku Tilli, Ari Lehto, Teruaki Motooka
Place of PublicationNorwich, NY, USA
Chapter23
Pages349-374
DOIs
Publication statusPublished - 2010
MoE publication typeA3 Part of a book or another research book

Cite this

Laermer, F., Franssila, S., Sainiemi, L., & Kolari, K. (2010). Deep reactive ion etching. In V. Lindroos, M. Tilli, A. Lehto, & T. Motooka (Eds.), Handbook of Silicon Based MEMS Materials & Technologies (pp. 349-374). Norwich, NY, USA. https://doi.org/10.1016/B978-0-8155-1594-4.00023-1
Laermer, Franz ; Franssila, Sami ; Sainiemi, Lauri ; Kolari, Kai. / Deep reactive ion etching. Handbook of Silicon Based MEMS Materials & Technologies. editor / Veikko Lindroos ; Markku Tilli ; Ari Lehto ; Teruaki Motooka. Norwich, NY, USA, 2010. pp. 349-374
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Laermer, F, Franssila, S, Sainiemi, L & Kolari, K 2010, Deep reactive ion etching. in V Lindroos, M Tilli, A Lehto & T Motooka (eds), Handbook of Silicon Based MEMS Materials & Technologies. Norwich, NY, USA, pp. 349-374. https://doi.org/10.1016/B978-0-8155-1594-4.00023-1

Deep reactive ion etching. / Laermer, Franz; Franssila, Sami; Sainiemi, Lauri; Kolari, Kai.

Handbook of Silicon Based MEMS Materials & Technologies. ed. / Veikko Lindroos; Markku Tilli; Ari Lehto; Teruaki Motooka. Norwich, NY, USA, 2010. p. 349-374.

Research output: Chapter in Book/Report/Conference proceedingChapter or book articleScientificpeer-review

TY - CHAP

T1 - Deep reactive ion etching

AU - Laermer, Franz

AU - Franssila, Sami

AU - Sainiemi, Lauri

AU - Kolari, Kai

N1 - CO:U Robert Bosch GmbH, Stuttgart, Germany CO:K Helsinki University of Technology CA2: TK610

PY - 2010

Y1 - 2010

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DO - 10.1016/B978-0-8155-1594-4.00023-1

M3 - Chapter or book article

SN - 978-0-8155-1594-4

SP - 349

EP - 374

BT - Handbook of Silicon Based MEMS Materials & Technologies

A2 - Lindroos, Veikko

A2 - Tilli, Markku

A2 - Lehto, Ari

A2 - Motooka, Teruaki

CY - Norwich, NY, USA

ER -

Laermer F, Franssila S, Sainiemi L, Kolari K. Deep reactive ion etching. In Lindroos V, Tilli M, Lehto A, Motooka T, editors, Handbook of Silicon Based MEMS Materials & Technologies. Norwich, NY, USA. 2010. p. 349-374 https://doi.org/10.1016/B978-0-8155-1594-4.00023-1