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Deep reactive ion etching

  • Franz Laermer
  • , Sami Franssila
  • , Lauri Sainiemi
  • , Kai Kolari
  • Helsinki University of Technology
  • Robert Bosch GmbH

Research output: Chapter in Book/Report/Conference proceedingChapter or book articleScientificpeer-review

Original languageEnglish
Title of host publicationHandbook of Silicon Based MEMS Materials & Technologies
Subtitle of host publicationA volume in Micro and Nano Technologies
EditorsVeikko Lindroos, Markku Tilli, Ari Lehto, Teruaki Motooka
Place of PublicationAmsterdam
PublisherElsevier
Chapter23
Pages349-374
ISBN (Print)978-0-8155-1594-4
DOIs
Publication statusPublished - 2010
MoE publication typeA3 Part of a book or another research book

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