Abstract
Feasibility of micron-scale SOI waveguides for dense photonics integration is demonstrated. Compact circuits are obtained by applying multiple etching steps on 3-12 μm thick SOI layers. Optoelectronics is integrated on SOI using thermo compression bonding.
Original language | English |
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Title of host publication | IEEE International Conference on Group IV Photonics GFP |
Publisher | IEEE Institute of Electrical and Electronic Engineers |
Pages | 107-108 |
ISBN (Electronic) | 978-1-4673-5804-0, 978-1-4673-5803-3 |
DOIs | |
Publication status | Published - 2013 |
MoE publication type | A4 Article in a conference publication |
Event | 10th International Conference on Group IV Photonics, GFP 2013 - Seoul, Korea, Democratic People's Republic of Duration: 28 Aug 2013 → 30 Aug 2013 |
Conference
Conference | 10th International Conference on Group IV Photonics, GFP 2013 |
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Abbreviated title | GFP 2013 |
Country/Territory | Korea, Democratic People's Republic of |
City | Seoul |
Period | 28/08/13 → 30/08/13 |
Keywords
- Hybrid integration
- photonic integrated circuit
- silicon photonics
- silicon-on-insulator
- waveguide