Abstract
Feasibility of micron-scale SOI waveguides for dense photonics integration is demonstrated. Compact circuits are obtained by applying multiple etching steps on 3-12 μm thick SOI layers. Optoelectronics is integrated on SOI using thermo compression bonding.
| Original language | English |
|---|---|
| Title of host publication | IEEE International Conference on Group IV Photonics GFP |
| Publisher | IEEE Institute of Electrical and Electronic Engineers |
| Pages | 107-108 |
| ISBN (Electronic) | 978-1-4673-5804-0, 978-1-4673-5803-3 |
| DOIs | |
| Publication status | Published - 2013 |
| MoE publication type | A4 Article in a conference publication |
| Event | 10th International Conference on Group IV Photonics, GFP 2013 - Seoul, Korea, Democratic People's Republic of Duration: 28 Aug 2013 → 30 Aug 2013 |
Conference
| Conference | 10th International Conference on Group IV Photonics, GFP 2013 |
|---|---|
| Abbreviated title | GFP 2013 |
| Country/Territory | Korea, Democratic People's Republic of |
| City | Seoul |
| Period | 28/08/13 → 30/08/13 |
Keywords
- Hybrid integration
- photonic integrated circuit
- silicon photonics
- silicon-on-insulator
- waveguide