Depth profiling of Al2O3 + TiO2 nanolaminates by means of a time-of-flight energy spectrometer

M. Laitinen (Corresponding Author), T. Sajavaara, M. Rossi, J. Julin, Riikka Puurunen, Tommi Suni, T. Ishida, H Fujita, K. Arstila, B. Brijs, H.J. Whitlow

Research output: Contribution to journalArticleScientificpeer-review

12 Citations (Scopus)

Abstract

Atomic layer deposition (ALD) is currently a widespread method to grow conformal thin films with a sub-nm thickness control. By using ALD for nanolaminate oxides, it is possible to fine tune the electrical, optical and mechanical properties of thin films. In this study the elemental depth profiles and surface roughnesses were determined for Al2O3 + TiO2 nanolaminates with nominal single-layer thicknesses of 1, 2, 5, 10 and 20 nm and total thickness between 40 nm and 60 nm. The depth profiles were measured by means of a time-of-flight elastic recoil detection analysis (ToF-ERDA) spectrometer recently installed at the University of Jyväskylä. In TOF-E measurements 63Cu, 35Cl, 12C and 4He ions with energies ranging from 0.5 to 10 MeV, were used and depth profiles of the whole nanolaminate film could be analyzed down to 5 nm individual layer thickness.
Original languageEnglish
Pages (from-to)3021-3024
JournalNuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms
Volume269
Issue number24
DOIs
Publication statusPublished - 2011
MoE publication typeA1 Journal article-refereed
Event10th European Conference on Accelerators in Applied Research and Technology (ECAART10) - Athens, Greece
Duration: 13 Sep 201017 Sep 2010

Fingerprint

Depth profiling
Atomic layer deposition
Spectrometers
spectrometers
Thickness control
Thin films
atomic layer epitaxy
Electric properties
Optical properties
profiles
Surface roughness
Mechanical properties
Oxides
energy
Ions
thin films
surface roughness
roughness
electrical properties
mechanical properties

Keywords

  • ToF-ERDA
  • ERD
  • depth profiling
  • Al2O3 and TiO2
  • nanolaminate
  • ALD

Cite this

Laitinen, M. ; Sajavaara, T. ; Rossi, M. ; Julin, J. ; Puurunen, Riikka ; Suni, Tommi ; Ishida, T. ; Fujita, H ; Arstila, K. ; Brijs, B. ; Whitlow, H.J. / Depth profiling of Al2O3 + TiO2 nanolaminates by means of a time-of-flight energy spectrometer. In: Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms. 2011 ; Vol. 269, No. 24. pp. 3021-3024.
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title = "Depth profiling of Al2O3 + TiO2 nanolaminates by means of a time-of-flight energy spectrometer",
abstract = "Atomic layer deposition (ALD) is currently a widespread method to grow conformal thin films with a sub-nm thickness control. By using ALD for nanolaminate oxides, it is possible to fine tune the electrical, optical and mechanical properties of thin films. In this study the elemental depth profiles and surface roughnesses were determined for Al2O3 + TiO2 nanolaminates with nominal single-layer thicknesses of 1, 2, 5, 10 and 20 nm and total thickness between 40 nm and 60 nm. The depth profiles were measured by means of a time-of-flight elastic recoil detection analysis (ToF-ERDA) spectrometer recently installed at the University of Jyv{\"a}skyl{\"a}. In TOF-E measurements 63Cu, 35Cl, 12C and 4He ions with energies ranging from 0.5 to 10 MeV, were used and depth profiles of the whole nanolaminate film could be analyzed down to 5 nm individual layer thickness.",
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author = "M. Laitinen and T. Sajavaara and M. Rossi and J. Julin and Riikka Puurunen and Tommi Suni and T. Ishida and H Fujita and K. Arstila and B. Brijs and H.J. Whitlow",
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Laitinen, M, Sajavaara, T, Rossi, M, Julin, J, Puurunen, R, Suni, T, Ishida, T, Fujita, H, Arstila, K, Brijs, B & Whitlow, HJ 2011, 'Depth profiling of Al2O3 + TiO2 nanolaminates by means of a time-of-flight energy spectrometer', Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms, vol. 269, no. 24, pp. 3021-3024. https://doi.org/10.1016/j.nimb.2011.04.074

Depth profiling of Al2O3 + TiO2 nanolaminates by means of a time-of-flight energy spectrometer. / Laitinen, M. (Corresponding Author); Sajavaara, T.; Rossi, M.; Julin, J.; Puurunen, Riikka; Suni, Tommi; Ishida, T.; Fujita, H; Arstila, K.; Brijs, B.; Whitlow, H.J.

In: Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms, Vol. 269, No. 24, 2011, p. 3021-3024.

Research output: Contribution to journalArticleScientificpeer-review

TY - JOUR

T1 - Depth profiling of Al2O3 + TiO2 nanolaminates by means of a time-of-flight energy spectrometer

AU - Laitinen, M.

AU - Sajavaara, T.

AU - Rossi, M.

AU - Julin, J.

AU - Puurunen, Riikka

AU - Suni, Tommi

AU - Ishida, T.

AU - Fujita, H

AU - Arstila, K.

AU - Brijs, B.

AU - Whitlow, H.J.

PY - 2011

Y1 - 2011

N2 - Atomic layer deposition (ALD) is currently a widespread method to grow conformal thin films with a sub-nm thickness control. By using ALD for nanolaminate oxides, it is possible to fine tune the electrical, optical and mechanical properties of thin films. In this study the elemental depth profiles and surface roughnesses were determined for Al2O3 + TiO2 nanolaminates with nominal single-layer thicknesses of 1, 2, 5, 10 and 20 nm and total thickness between 40 nm and 60 nm. The depth profiles were measured by means of a time-of-flight elastic recoil detection analysis (ToF-ERDA) spectrometer recently installed at the University of Jyväskylä. In TOF-E measurements 63Cu, 35Cl, 12C and 4He ions with energies ranging from 0.5 to 10 MeV, were used and depth profiles of the whole nanolaminate film could be analyzed down to 5 nm individual layer thickness.

AB - Atomic layer deposition (ALD) is currently a widespread method to grow conformal thin films with a sub-nm thickness control. By using ALD for nanolaminate oxides, it is possible to fine tune the electrical, optical and mechanical properties of thin films. In this study the elemental depth profiles and surface roughnesses were determined for Al2O3 + TiO2 nanolaminates with nominal single-layer thicknesses of 1, 2, 5, 10 and 20 nm and total thickness between 40 nm and 60 nm. The depth profiles were measured by means of a time-of-flight elastic recoil detection analysis (ToF-ERDA) spectrometer recently installed at the University of Jyväskylä. In TOF-E measurements 63Cu, 35Cl, 12C and 4He ions with energies ranging from 0.5 to 10 MeV, were used and depth profiles of the whole nanolaminate film could be analyzed down to 5 nm individual layer thickness.

KW - ToF-ERDA

KW - ERD

KW - depth profiling

KW - Al2O3 and TiO2

KW - nanolaminate

KW - ALD

U2 - 10.1016/j.nimb.2011.04.074

DO - 10.1016/j.nimb.2011.04.074

M3 - Article

VL - 269

SP - 3021

EP - 3024

JO - Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms

JF - Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms

SN - 0168-583X

IS - 24

ER -