Depth profiling of Al₂O₃ + TiO₂ nanolaminates by means of a time-of-flight energy spectrometer

INIS

• layers 100%
• thickness 100%
• energy 100%
• titanium oxides 100%
• depth 100%
• time-of-flight method 100%
• spectrometers 100%
• thin films 50%
• deposition 50%
• control 25%
• surfaces 25%
• roughness 25%
• oxides 25%
• mechanical properties 25%
• detection 25%
• electrical properties 25%
• optical properties 25%
• films 25%
• ions 25%
• helium 4 25%
• universities 25%
• recoils 25%
• carbon 12 25%
• copper 63 25%
• chlorine 35 25%

Keyphrases

• TiO2-Al2O3 100%
• Nanolaminates 100%
• Depth Profiling 100%
• Energy Spectrometer 100%
• Atomic Layer Deposition 66%
• Depth Profile 66%
• Surface Roughness 33%
• Oxides 33%
• Thickness Control 33%
• Elemental Depth Profiles 33%
• Spectrometer 33%
• Time-of-flight Elastic Recoil Detection Analysis 33%
• Individual Layer Thickness 33%
• Mechanical Properties of Thin Films 33%
• He Ions 33%
• 12C Ions 33%
• Single-layer Thickness 33%
• Profile Roughness 33%
• Electrical-optical Properties 33%
• TOF-E 33%
• Optical Properties of Thin Films 33%
• Conformal Thin Film 33%
• Nanolaminate Films 33%
• Electrical Properties of Thin Film 33%

Engineering

• Depth Profile 100%
• Time-of-Flight 100%
• Energy Engineering 100%
• Layer Thickness 66%
• Atomic Layer Deposition 66%
• Thin Films 66%
• Individual Layer 33%