INIS
layers
100%
thickness
100%
energy
100%
titanium oxides
100%
depth
100%
time-of-flight method
100%
spectrometers
100%
thin films
50%
deposition
50%
control
25%
surfaces
25%
roughness
25%
oxides
25%
mechanical properties
25%
detection
25%
electrical properties
25%
optical properties
25%
films
25%
ions
25%
helium 4
25%
universities
25%
recoils
25%
carbon 12
25%
copper 63
25%
chlorine 35
25%
Keyphrases
TiO2-Al2O3
100%
Nanolaminates
100%
Depth Profiling
100%
Energy Spectrometer
100%
Atomic Layer Deposition
66%
Depth Profile
66%
Surface Roughness
33%
Oxides
33%
Thickness Control
33%
Elemental Depth Profiles
33%
Spectrometer
33%
Time-of-flight Elastic Recoil Detection Analysis
33%
Individual Layer Thickness
33%
Mechanical Properties of Thin Films
33%
He Ions
33%
12C Ions
33%
Single-layer Thickness
33%
Profile Roughness
33%
Electrical-optical Properties
33%
TOF-E
33%
Optical Properties of Thin Films
33%
Conformal Thin Film
33%
Nanolaminate Films
33%
Electrical Properties of Thin Film
33%
Engineering
Depth Profile
100%
Time-of-Flight
100%
Layer Thickness
66%
Atomic Layer Deposition
66%
Thin Films
66%
Individual Layer
33%