@inbook{a06ba4fa0395432a83f717efb1ec17cb,
title = "Deuterium retention in Si doped carbon films",
abstract = "Deuterium retention, solubility and out-diffusion have been studied in silicon doped films produced by physical vapor deposition. The deuterium concentration profiles were measured by the time-of-flight elastic recoil detection analysis technique and secondary ion massa spectrometry. The D retention and solubility were measured in D implanted carbon samples. The out-diffusion of D was investigated in D co-deposit samples. The solubility of D was shown to increase as a function of Si concentration in the co-deposited samples while in the implanted samples no dependence of the Si content was observed. It was proposed that annealing behavior of deuterium has a trapping-like character.",
author = "E. Vainonen-Ahlgren and T. Sajavaara and W. Rydman and T. Ahlgren and J. Nordlund and J. Keinonen and Jari Likonen and Sari Lehto and C. Wu",
note = "Project code: K9SU00212",
year = "2000",
language = "English",
isbn = "978-0-7923-6630-0",
series = "NATO Science Series II: Mathematics, Physics and Chemistry",
publisher = "Springer",
pages = "281--287",
editor = "Wu, {C. H.}",
booktitle = "Hydrogen Recycling at Plasma Facing Materials",
address = "Germany",
}