Development and characterization of imprint-resists as masks for plasma etching

C. Cardinaud, F. Gaboriau, A. Bousquet, K. Pfeiffer, F. Reuther, M. Fink, G. Grueztner, H. Shultz, H.C. Scheer, C.M. Sotomayor Torres, L. Montelius, C. Mayer, Jouni Ahopelto

Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

Original languageEnglish
Title of host publicationProceedings of the First International Conference on Nanoimprint Nanoprint Technology, NNT Conference, San Francisco, CA, 11-13 Dec, 2002
Place of PublicationSan Francisco
Pages152-153
Publication statusPublished - 2002
MoE publication typeNot Eligible
Event1st International Conference on Nanoimprint and Nanoprint Technology, NNT'02 - San Francisco, United States
Duration: 11 Dec 200213 Dec 2002

Conference

Conference1st International Conference on Nanoimprint and Nanoprint Technology, NNT'02
Abbreviated titleNNT 2002
CountryUnited States
CitySan Francisco
Period11/12/0213/12/02

Keywords

  • Nanoimprint Lithography

Cite this

Cardinaud, C., Gaboriau, F., Bousquet, A., Pfeiffer, K., Reuther, F., Fink, M., ... Ahopelto, J. (2002). Development and characterization of imprint-resists as masks for plasma etching. In Proceedings of the First International Conference on Nanoimprint Nanoprint Technology, NNT Conference, San Francisco, CA, 11-13 Dec, 2002 (pp. 152-153). San Francisco.
Cardinaud, C. ; Gaboriau, F. ; Bousquet, A. ; Pfeiffer, K. ; Reuther, F. ; Fink, M. ; Grueztner, G. ; Shultz, H. ; Scheer, H.C. ; Sotomayor Torres, C.M. ; Montelius, L. ; Mayer, C. ; Ahopelto, Jouni. / Development and characterization of imprint-resists as masks for plasma etching. Proceedings of the First International Conference on Nanoimprint Nanoprint Technology, NNT Conference, San Francisco, CA, 11-13 Dec, 2002. San Francisco, 2002. pp. 152-153
@inbook{619f821ac2934ba487e5c082aed4e7f3,
title = "Development and characterization of imprint-resists as masks for plasma etching",
keywords = "Nanoimprint Lithography",
author = "C. Cardinaud and F. Gaboriau and A. Bousquet and K. Pfeiffer and F. Reuther and M. Fink and G. Grueztner and H. Shultz and H.C. Scheer and {Sotomayor Torres}, C.M. and L. Montelius and C. Mayer and Jouni Ahopelto",
year = "2002",
language = "English",
pages = "152--153",
booktitle = "Proceedings of the First International Conference on Nanoimprint Nanoprint Technology, NNT Conference, San Francisco, CA, 11-13 Dec, 2002",

}

Cardinaud, C, Gaboriau, F, Bousquet, A, Pfeiffer, K, Reuther, F, Fink, M, Grueztner, G, Shultz, H, Scheer, HC, Sotomayor Torres, CM, Montelius, L, Mayer, C & Ahopelto, J 2002, Development and characterization of imprint-resists as masks for plasma etching. in Proceedings of the First International Conference on Nanoimprint Nanoprint Technology, NNT Conference, San Francisco, CA, 11-13 Dec, 2002. San Francisco, pp. 152-153, 1st International Conference on Nanoimprint and Nanoprint Technology, NNT'02 , San Francisco, United States, 11/12/02.

Development and characterization of imprint-resists as masks for plasma etching. / Cardinaud, C.; Gaboriau, F.; Bousquet, A.; Pfeiffer, K.; Reuther, F.; Fink, M.; Grueztner, G.; Shultz, H.; Scheer, H.C.; Sotomayor Torres, C.M.; Montelius, L.; Mayer, C.; Ahopelto, Jouni.

Proceedings of the First International Conference on Nanoimprint Nanoprint Technology, NNT Conference, San Francisco, CA, 11-13 Dec, 2002. San Francisco, 2002. p. 152-153.

Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

TY - CHAP

T1 - Development and characterization of imprint-resists as masks for plasma etching

AU - Cardinaud, C.

AU - Gaboriau, F.

AU - Bousquet, A.

AU - Pfeiffer, K.

AU - Reuther, F.

AU - Fink, M.

AU - Grueztner, G.

AU - Shultz, H.

AU - Scheer, H.C.

AU - Sotomayor Torres, C.M.

AU - Montelius, L.

AU - Mayer, C.

AU - Ahopelto, Jouni

PY - 2002

Y1 - 2002

KW - Nanoimprint Lithography

M3 - Conference abstract in proceedings

SP - 152

EP - 153

BT - Proceedings of the First International Conference on Nanoimprint Nanoprint Technology, NNT Conference, San Francisco, CA, 11-13 Dec, 2002

CY - San Francisco

ER -

Cardinaud C, Gaboriau F, Bousquet A, Pfeiffer K, Reuther F, Fink M et al. Development and characterization of imprint-resists as masks for plasma etching. In Proceedings of the First International Conference on Nanoimprint Nanoprint Technology, NNT Conference, San Francisco, CA, 11-13 Dec, 2002. San Francisco. 2002. p. 152-153