Development and characterization of imprint-resists as masks for plasma etching

C. Cardinaud, F. Gaboriau, A. Bousquet, K. Pfeiffer, F. Reuther, M. Fink, G. Grueztner, H. Shultz, H.C. Scheer, C.M. Sotomayor Torres, L. Montelius, C. Mayer, Jouni Ahopelto

Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

Original languageEnglish
Title of host publicationProceedings of the First International Conference on Nanoimprint Nanoprint Technology, NNT Conference, San Francisco, CA, 11-13 Dec, 2002
Place of PublicationSan Francisco
Pages152-153
Publication statusPublished - 2002
MoE publication typeNot Eligible
Event1st International Conference on Nanoimprint and Nanoprint Technology, NNT'02 - San Francisco, United States
Duration: 11 Dec 200213 Dec 2002

Conference

Conference1st International Conference on Nanoimprint and Nanoprint Technology, NNT'02
Abbreviated titleNNT 2002
CountryUnited States
CitySan Francisco
Period11/12/0213/12/02

Keywords

  • Nanoimprint Lithography

Cite this

Cardinaud, C., Gaboriau, F., Bousquet, A., Pfeiffer, K., Reuther, F., Fink, M., Grueztner, G., Shultz, H., Scheer, H. C., Sotomayor Torres, C. M., Montelius, L., Mayer, C., & Ahopelto, J. (2002). Development and characterization of imprint-resists as masks for plasma etching. In Proceedings of the First International Conference on Nanoimprint Nanoprint Technology, NNT Conference, San Francisco, CA, 11-13 Dec, 2002 (pp. 152-153).