Direct patterning of micro-optical structures by combined nanoimprinting and lithography

Jarkko Tuominen, Jussi Hiltunen, A. Wojdyla, Mikko Karppinen, A. Suutala, H. Jantunen, R. Bouffaron, L. Escoubas

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

2 Citations (Scopus)

Abstract

The driving force behind combining the nanoimprinting and photolithography is to effectively utilize the advantages of both patterning techniques simultaneously. Conventional shadow-mask UV-lithography can be used to pattern micron-scale structures uniformly over large areas, whereas nanoimprinting enables patterning of nanoscale features, which can also be tilted or round-shaped. We present the work on direct patterning of micro-optical structures by combined nanoimprinting and lithography using modified mask aligner, hybrid mask mold and directly patternable, UV-curable materials. Patterning of structures is carried out in wafer-level fashion. Hybrid mask mold fabrication can be realized for example by modifying conventional shadow-mask using focused ion beam (FIB) milling, or by patterning a mold area on shadow-mask surface by nanoimprinting. One of the advantages of proposed fabrication method is that there is no need for reactive ion etching (RIE) process steps. We present also near-field holography (NFH) as a method of grating mold fabrication. Fabricated micro-optical structures include directly patterned waveguides with light coupling gratings, and also pyramid-shaped gratings which show antireflection properties in the mid-infrared spectral region.
Original languageEnglish
Title of host publicationMicro-Optics 2008
PublisherInternational Society for Optics and Photonics SPIE
DOIs
Publication statusPublished - 2008
MoE publication typeA4 Article in a conference publication
EventMicro-Optics 2008. Strasbourg, France, 7 April 2008 -
Duration: 1 Jan 2008 → …

Publication series

SeriesProceedings of SPIE
Volume6992
ISSN0277-786X

Conference

ConferenceMicro-Optics 2008. Strasbourg, France, 7 April 2008
Period1/01/08 → …

Fingerprint

masks
lithography
gratings
fabrication
photolithography
pyramids
holography
near fields
ion beams
etching
wafers
waveguides
ions

Keywords

  • Antireflection coating
  • Diffractive grating
  • Direct patterning
  • Infrared
  • Polymer waveguide
  • UV-NIL

Cite this

Tuominen, J., Hiltunen, J., Wojdyla, A., Karppinen, M., Suutala, A., Jantunen, H., ... Escoubas, L. (2008). Direct patterning of micro-optical structures by combined nanoimprinting and lithography. In Micro-Optics 2008 [69920B] International Society for Optics and Photonics SPIE. Proceedings of SPIE, Vol.. 6992 https://doi.org/10.1117/12.781151
Tuominen, Jarkko ; Hiltunen, Jussi ; Wojdyla, A. ; Karppinen, Mikko ; Suutala, A. ; Jantunen, H. ; Bouffaron, R. ; Escoubas, L. / Direct patterning of micro-optical structures by combined nanoimprinting and lithography. Micro-Optics 2008. International Society for Optics and Photonics SPIE, 2008. (Proceedings of SPIE, Vol. 6992).
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abstract = "The driving force behind combining the nanoimprinting and photolithography is to effectively utilize the advantages of both patterning techniques simultaneously. Conventional shadow-mask UV-lithography can be used to pattern micron-scale structures uniformly over large areas, whereas nanoimprinting enables patterning of nanoscale features, which can also be tilted or round-shaped. We present the work on direct patterning of micro-optical structures by combined nanoimprinting and lithography using modified mask aligner, hybrid mask mold and directly patternable, UV-curable materials. Patterning of structures is carried out in wafer-level fashion. Hybrid mask mold fabrication can be realized for example by modifying conventional shadow-mask using focused ion beam (FIB) milling, or by patterning a mold area on shadow-mask surface by nanoimprinting. One of the advantages of proposed fabrication method is that there is no need for reactive ion etching (RIE) process steps. We present also near-field holography (NFH) as a method of grating mold fabrication. Fabricated micro-optical structures include directly patterned waveguides with light coupling gratings, and also pyramid-shaped gratings which show antireflection properties in the mid-infrared spectral region.",
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author = "Jarkko Tuominen and Jussi Hiltunen and A. Wojdyla and Mikko Karppinen and A. Suutala and H. Jantunen and R. Bouffaron and L. Escoubas",
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Tuominen, J, Hiltunen, J, Wojdyla, A, Karppinen, M, Suutala, A, Jantunen, H, Bouffaron, R & Escoubas, L 2008, Direct patterning of micro-optical structures by combined nanoimprinting and lithography. in Micro-Optics 2008., 69920B, International Society for Optics and Photonics SPIE, Proceedings of SPIE, vol. 6992, Micro-Optics 2008. Strasbourg, France, 7 April 2008, 1/01/08. https://doi.org/10.1117/12.781151

Direct patterning of micro-optical structures by combined nanoimprinting and lithography. / Tuominen, Jarkko; Hiltunen, Jussi; Wojdyla, A.; Karppinen, Mikko; Suutala, A.; Jantunen, H.; Bouffaron, R.; Escoubas, L.

Micro-Optics 2008. International Society for Optics and Photonics SPIE, 2008. 69920B (Proceedings of SPIE, Vol. 6992).

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

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AB - The driving force behind combining the nanoimprinting and photolithography is to effectively utilize the advantages of both patterning techniques simultaneously. Conventional shadow-mask UV-lithography can be used to pattern micron-scale structures uniformly over large areas, whereas nanoimprinting enables patterning of nanoscale features, which can also be tilted or round-shaped. We present the work on direct patterning of micro-optical structures by combined nanoimprinting and lithography using modified mask aligner, hybrid mask mold and directly patternable, UV-curable materials. Patterning of structures is carried out in wafer-level fashion. Hybrid mask mold fabrication can be realized for example by modifying conventional shadow-mask using focused ion beam (FIB) milling, or by patterning a mold area on shadow-mask surface by nanoimprinting. One of the advantages of proposed fabrication method is that there is no need for reactive ion etching (RIE) process steps. We present also near-field holography (NFH) as a method of grating mold fabrication. Fabricated micro-optical structures include directly patterned waveguides with light coupling gratings, and also pyramid-shaped gratings which show antireflection properties in the mid-infrared spectral region.

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Tuominen J, Hiltunen J, Wojdyla A, Karppinen M, Suutala A, Jantunen H et al. Direct patterning of micro-optical structures by combined nanoimprinting and lithography. In Micro-Optics 2008. International Society for Optics and Photonics SPIE. 2008. 69920B. (Proceedings of SPIE, Vol. 6992). https://doi.org/10.1117/12.781151