Direct patterning of micro-optical structures by combined nanoimprinting and lithography

Jarkko Tuominen, Jussi Hiltunen, A. Wojdyla, Mikko Karppinen, A. Suutala, H. Jantunen, R. Bouffaron, L. Escoubas

    Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

    2 Citations (Scopus)


    The driving force behind combining the nanoimprinting and photolithography is to effectively utilize the advantages of both patterning techniques simultaneously. Conventional shadow-mask UV-lithography can be used to pattern micron-scale structures uniformly over large areas, whereas nanoimprinting enables patterning of nanoscale features, which can also be tilted or round-shaped. We present the work on direct patterning of micro-optical structures by combined nanoimprinting and lithography using modified mask aligner, hybrid mask mold and directly patternable, UV-curable materials. Patterning of structures is carried out in wafer-level fashion. Hybrid mask mold fabrication can be realized for example by modifying conventional shadow-mask using focused ion beam (FIB) milling, or by patterning a mold area on shadow-mask surface by nanoimprinting. One of the advantages of proposed fabrication method is that there is no need for reactive ion etching (RIE) process steps. We present also near-field holography (NFH) as a method of grating mold fabrication. Fabricated micro-optical structures include directly patterned waveguides with light coupling gratings, and also pyramid-shaped gratings which show antireflection properties in the mid-infrared spectral region.
    Original languageEnglish
    Title of host publicationMicro-Optics 2008
    PublisherInternational Society for Optics and Photonics SPIE
    Publication statusPublished - 2008
    MoE publication typeA4 Article in a conference publication
    EventMicro-Optics 2008. Strasbourg, France, 7 April 2008 -
    Duration: 1 Jan 2008 → …

    Publication series

    SeriesProceedings of SPIE


    ConferenceMicro-Optics 2008. Strasbourg, France, 7 April 2008
    Period1/01/08 → …


    • Antireflection coating
    • Diffractive grating
    • Direct patterning
    • Infrared
    • Polymer waveguide
    • UV-NIL


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