Abstract
| Original language | English |
|---|---|
| Pages (from-to) | 3988-3998 |
| Journal | Applied Optics |
| Volume | 41 |
| Issue number | 19 |
| DOIs | |
| Publication status | Published - 2002 |
| MoE publication type | A1 Journal article-refereed |
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Direct photolithographic deforming of organomodified siloxane films for micro-optics fabrication. / Kärkkäinen, Ari; Tamkin, John M.; Rogers, Jeremy D.; Neal, Daniel R.; Hormi, Osmo; Jabbour, Ghassan E.; Rantala, Juha; Descour, Michael R.
In: Applied Optics, Vol. 41, No. 19, 2002, p. 3988-3998.Research output: Contribution to journal › Article › Scientific › peer-review
TY - JOUR
T1 - Direct photolithographic deforming of organomodified siloxane films for micro-optics fabrication
AU - Kärkkäinen, Ari
AU - Tamkin, John M.
AU - Rogers, Jeremy D.
AU - Neal, Daniel R.
AU - Hormi, Osmo
AU - Jabbour, Ghassan E.
AU - Rantala, Juha
AU - Descour, Michael R.
PY - 2002
Y1 - 2002
N2 - Direct photolithographic deforming of hybrid glass films is used to fabricate optical structures. The structure is fabricated in polyethylene-oxide-acrylate modified hybrid glass films with (1) binary and gray-scale photomasks using a mercury UV-lamp exposure and (2) maskless UV-laser patterning. Fabrication of isolated lenslets, lens arrays, and gratings is presented, including the associated exposure patterns. The hybrid glass material yields light-induced deformation peak-to-valley (p.v.) heights up to 12.8 µm with mercury UV-lamp exposure and p.v. deformation heights up to 6.8 µm with 365-nm UV-laser exposure. The fabricated lenslets’ surface data are presented as Zernike-polynomial fit coefficients. Material synthesis and processing-related aspects are examined to understand and control the material’s deformation under exposure. The hybrid glass material exhibits a maximum spectral extinction coefficient of 1.6 × 10-3 µm-1 at wavelengths ranging from 450 to 2200 nm and has a refractive index of 1.52 at 632.8 nm. The fabricated structures exhibit rms surface roughness between 1 and 5 nm.
AB - Direct photolithographic deforming of hybrid glass films is used to fabricate optical structures. The structure is fabricated in polyethylene-oxide-acrylate modified hybrid glass films with (1) binary and gray-scale photomasks using a mercury UV-lamp exposure and (2) maskless UV-laser patterning. Fabrication of isolated lenslets, lens arrays, and gratings is presented, including the associated exposure patterns. The hybrid glass material yields light-induced deformation peak-to-valley (p.v.) heights up to 12.8 µm with mercury UV-lamp exposure and p.v. deformation heights up to 6.8 µm with 365-nm UV-laser exposure. The fabricated lenslets’ surface data are presented as Zernike-polynomial fit coefficients. Material synthesis and processing-related aspects are examined to understand and control the material’s deformation under exposure. The hybrid glass material exhibits a maximum spectral extinction coefficient of 1.6 × 10-3 µm-1 at wavelengths ranging from 450 to 2200 nm and has a refractive index of 1.52 at 632.8 nm. The fabricated structures exhibit rms surface roughness between 1 and 5 nm.
U2 - 10.1364/AO.41.003988
DO - 10.1364/AO.41.003988
M3 - Article
VL - 41
SP - 3988
EP - 3998
JO - Applied Optics
JF - Applied Optics
SN - 1559-128X
IS - 19
ER -