Direct UV patterning of thick hybrid glass films for micro-opto-mechanical structures

Juha Rantala, Raviv Levy, Liisa Kivimäki, Michael Descour

Research output: Contribution to journalArticleScientificpeer-review

16 Citations (Scopus)

Abstract

The hybrid sol-gel method is applied to the fabrication of optical and mechanical structures into a photosensitive glass material. High optical quality thick films and structures are fabricated by a one-step spin-coating process followed by direct UV imprinting. A material thickness of 27.5 µm and a maximum patterned thickness of 17.4 µm at an aspect ratio of 0.6 have been achieved. The material exhibits a minimum transmittance of 97% between 400 and 1100 nm, a refractive index of 1.49, and an RMS surface roughness of 14.8 nm after development.

Original languageEnglish
Pages (from-to)530 - 531
Number of pages2
JournalElectronics Letters
Volume36
Issue number6
DOIs
Publication statusPublished - 2000
MoE publication typeA1 Journal article-refereed

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Glass
Photosensitive glass
Spin coating
Thick films
Sol-gel process
Aspect ratio
Refractive index
Surface roughness
Fabrication

Cite this

Rantala, Juha ; Levy, Raviv ; Kivimäki, Liisa ; Descour, Michael. / Direct UV patterning of thick hybrid glass films for micro-opto-mechanical structures. In: Electronics Letters. 2000 ; Vol. 36, No. 6. pp. 530 - 531.
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Direct UV patterning of thick hybrid glass films for micro-opto-mechanical structures. / Rantala, Juha; Levy, Raviv; Kivimäki, Liisa; Descour, Michael.

In: Electronics Letters, Vol. 36, No. 6, 2000, p. 530 - 531.

Research output: Contribution to journalArticleScientificpeer-review

TY - JOUR

T1 - Direct UV patterning of thick hybrid glass films for micro-opto-mechanical structures

AU - Rantala, Juha

AU - Levy, Raviv

AU - Kivimäki, Liisa

AU - Descour, Michael

PY - 2000

Y1 - 2000

N2 - The hybrid sol-gel method is applied to the fabrication of optical and mechanical structures into a photosensitive glass material. High optical quality thick films and structures are fabricated by a one-step spin-coating process followed by direct UV imprinting. A material thickness of 27.5 µm and a maximum patterned thickness of 17.4 µm at an aspect ratio of 0.6 have been achieved. The material exhibits a minimum transmittance of 97% between 400 and 1100 nm, a refractive index of 1.49, and an RMS surface roughness of 14.8 nm after development.

AB - The hybrid sol-gel method is applied to the fabrication of optical and mechanical structures into a photosensitive glass material. High optical quality thick films and structures are fabricated by a one-step spin-coating process followed by direct UV imprinting. A material thickness of 27.5 µm and a maximum patterned thickness of 17.4 µm at an aspect ratio of 0.6 have been achieved. The material exhibits a minimum transmittance of 97% between 400 and 1100 nm, a refractive index of 1.49, and an RMS surface roughness of 14.8 nm after development.

U2 - 10.1049/el:20000429

DO - 10.1049/el:20000429

M3 - Article

VL - 36

SP - 530

EP - 531

JO - Electronics Letters

JF - Electronics Letters

SN - 0013-5194

IS - 6

ER -