Directly UV-photopatternable PLZT thin films prepared with the Sol-Gel technique

Terho Kololuoma; Jussi Hiltunen; Markus Tuomikoski; Jyrki Lappalainen; Juha Rantala

doi:10.1117/12.528803

Directly UV-photopatternable PLZT thin films prepared with the Sol-Gel technique

Terho Kololuoma, Jussi Hiltunen, Markus Tuomikoski, Jyrki Lappalainen, Juha Rantala

Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review

4 Citations (Scopus)

Abstract

In this study, the sol-gel process to fabricate directly UV-photopatternable lanthanum-doped lead zirconate titanate (PLZT) films was investigated. Photosensitive films were obtained via methacrylic acid modification of metal organic PLZT precursors. Spin-on deposited films were patterned using direct UV-photolithography process. Patterned films were annealed in air, in order to obtain perovskite type crystalline material. AFM and XRD techniques were used for the characterization of the material and fabricated structures. The sol-gel processed PLZT films had good crystallinity, they were crack-free, and had low surface roughness. The films exhibit electro-optic effect being therefore interesting to be used in active integrated optic devices.

Original language	English
Title of host publication	Integrated Optics: Devices, Materials, and Technologies VIII
Publisher	International Society for Optics and Photonics SPIE
Pages	33 - 39
DOIs	https://doi.org/10.1117/12.528803
Publication status	Published - 2004
MoE publication type	A4 Article in a conference publication

Publication series

Series	Proceedings of SPIE
Volume	5355
ISSN	0277-786X

Keywords

Sol-gel
direct UV-photopatterning
PLZT
electro-optic effect

Access to Document

10.1117/12.528803

Cite this

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title = "Directly UV-photopatternable PLZT thin films prepared with the Sol-Gel technique",

abstract = "In this study, the sol-gel process to fabricate directly UV-photopatternable lanthanum-doped lead zirconate titanate (PLZT) films was investigated. Photosensitive films were obtained via methacrylic acid modification of metal organic PLZT precursors. Spin-on deposited films were patterned using direct UV-photolithography process. Patterned films were annealed in air, in order to obtain perovskite type crystalline material. AFM and XRD techniques were used for the characterization of the material and fabricated structures. The sol-gel processed PLZT films had good crystallinity, they were crack-free, and had low surface roughness. The films exhibit electro-optic effect being therefore interesting to be used in active integrated optic devices.",

keywords = "Sol-gel, direct UV-photopatterning, PLZT, electro-optic effect",

author = "Terho Kololuoma and Jussi Hiltunen and Markus Tuomikoski and Jyrki Lappalainen and Juha Rantala",

year = "2004",

doi = "10.1117/12.528803",

language = "English",

series = "Proceedings of SPIE",

publisher = "International Society for Optics and Photonics SPIE",

pages = "33 -- 39",

booktitle = "Integrated Optics: Devices, Materials, and Technologies VIII",

address = "United States",

}

Directly UV-photopatternable PLZT thin films prepared with the Sol-Gel technique. / Kololuoma, Terho; Hiltunen, Jussi ; Tuomikoski, Markus et al.
Integrated Optics: Devices, Materials, and Technologies VIII. International Society for Optics and Photonics SPIE, 2004. p. 33 - 39 (Proceedings of SPIE, Vol. 5355).

Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review

TY - GEN

T1 - Directly UV-photopatternable PLZT thin films prepared with the Sol-Gel technique

AU - Kololuoma, Terho

AU - Hiltunen, Jussi

AU - Tuomikoski, Markus

AU - Lappalainen, Jyrki

AU - Rantala, Juha

PY - 2004

Y1 - 2004

N2 - In this study, the sol-gel process to fabricate directly UV-photopatternable lanthanum-doped lead zirconate titanate (PLZT) films was investigated. Photosensitive films were obtained via methacrylic acid modification of metal organic PLZT precursors. Spin-on deposited films were patterned using direct UV-photolithography process. Patterned films were annealed in air, in order to obtain perovskite type crystalline material. AFM and XRD techniques were used for the characterization of the material and fabricated structures. The sol-gel processed PLZT films had good crystallinity, they were crack-free, and had low surface roughness. The films exhibit electro-optic effect being therefore interesting to be used in active integrated optic devices.

AB - In this study, the sol-gel process to fabricate directly UV-photopatternable lanthanum-doped lead zirconate titanate (PLZT) films was investigated. Photosensitive films were obtained via methacrylic acid modification of metal organic PLZT precursors. Spin-on deposited films were patterned using direct UV-photolithography process. Patterned films were annealed in air, in order to obtain perovskite type crystalline material. AFM and XRD techniques were used for the characterization of the material and fabricated structures. The sol-gel processed PLZT films had good crystallinity, they were crack-free, and had low surface roughness. The films exhibit electro-optic effect being therefore interesting to be used in active integrated optic devices.

KW - Sol-gel

KW - direct UV-photopatterning

KW - PLZT

KW - electro-optic effect

U2 - 10.1117/12.528803

DO - 10.1117/12.528803

M3 - Conference article in proceedings

T3 - Proceedings of SPIE

SP - 33

EP - 39

BT - Integrated Optics: Devices, Materials, and Technologies VIII

PB - International Society for Optics and Photonics SPIE

ER -

Directly UV-photopatternable PLZT thin films prepared with the Sol-Gel technique

Abstract

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Keywords

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