Directly UV-photopatternable PLZT thin films prepared with the Sol-Gel technique

Terho Kololuoma, Jussi Hiltunen, Markus Tuomikoski, Jyrki Lappalainen, Juha Rantala

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

4 Citations (Scopus)

Abstract

In this study, the sol-gel process to fabricate directly UV-photopatternable lanthanum-doped lead zirconate titanate (PLZT) films was investigated. Photosensitive films were obtained via methacrylic acid modification of metal organic PLZT precursors. Spin-on deposited films were patterned using direct UV-photolithography process. Patterned films were annealed in air, in order to obtain perovskite type crystalline material. AFM and XRD techniques were used for the characterization of the material and fabricated structures. The sol-gel processed PLZT films had good crystallinity, they were crack-free, and had low surface roughness. The films exhibit electro-optic effect being therefore interesting to be used in active integrated optic devices.
Original languageEnglish
Title of host publicationIntegrated Optics: Devices, Materials, and Technologies VIII
PublisherInternational Society for Optics and Photonics SPIE
Pages33 - 39
DOIs
Publication statusPublished - 2004
MoE publication typeA4 Article in a conference publication

Publication series

SeriesProceedings of SPIE
Volume5355
ISSN0277-786X

Keywords

  • Sol-gel
  • direct UV-photopatterning
  • PLZT
  • electro-optic effect

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    Kololuoma, T., Hiltunen, J., Tuomikoski, M., Lappalainen, J., & Rantala, J. (2004). Directly UV-photopatternable PLZT thin films prepared with the Sol-Gel technique. In Integrated Optics: Devices, Materials, and Technologies VIII (pp. 33 - 39). International Society for Optics and Photonics SPIE. Proceedings of SPIE, Vol.. 5355 https://doi.org/10.1117/12.528803