Abstract
GaN layers grown by metal organic vapour phase epitaxy on sapphire were imaged by synchrotron radiation X-ray topography. The threading dislocations could not be resolved in the topographs due to their high density, but a smaller density of about 10 5 cm -2 defects were seen in the interface between GaN and sapphire by utilizing large-area back-reflection topography for the sapphire substrates. The misfit dislocation images in the topographs form a well-resolved cellular network, in which the average cell size is roughly 30 μm. Different cell shapes in the misfit dislocation networks are observed on different samples. Also, images of small-angle grains of similar size were found in transmission section topographs of the GaN layers.
Original language | English |
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Pages (from-to) | 143-148 |
Number of pages | 6 |
Journal | Journal of Materials Science: Materials in Electronics |
Volume | 19 |
Issue number | 2 |
DOIs | |
Publication status | Published - 2008 |
MoE publication type | A1 Journal article-refereed |