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Dislocations at the interface between sapphire and GaN

  • Aapo Lankinen*
  • , T. Lang
  • , Sami Suihkonen
  • , O. Svensk
  • , A. Säynätjoki
  • , T. O. Tuomi
  • , P. J. McNally
  • , M. Odnoblyudov
  • , V. Bougrov
  • , A. N. Danilewsky
  • , P. Bergman
  • , R. Simon
  • *Corresponding author for this work
  • Dublin City University
  • Ioffe Institute
  • University of Freiburg
  • University of Linköping
  • Karlsruhe Institute of Technology (KIT)
  • Helsinki University of Technology

Research output: Contribution to journalArticleScientificpeer-review

Abstract

GaN layers grown by metal organic vapour phase epitaxy on sapphire were imaged by synchrotron radiation X-ray topography. The threading dislocations could not be resolved in the topographs due to their high density, but a smaller density of about 10 5 cm -2 defects were seen in the interface between GaN and sapphire by utilizing large-area back-reflection topography for the sapphire substrates. The misfit dislocation images in the topographs form a well-resolved cellular network, in which the average cell size is roughly 30 μm. Different cell shapes in the misfit dislocation networks are observed on different samples. Also, images of small-angle grains of similar size were found in transmission section topographs of the GaN layers.
Original languageEnglish
Pages (from-to)143-148
Number of pages6
JournalJournal of Materials Science: Materials in Electronics
Volume19
Issue number2
DOIs
Publication statusPublished - 2008
MoE publication typeA1 Journal article-refereed

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