Dopant Concentration Analysis of ALD Thin Films in 3D Structures by ToF-SIMS

Alireza M. Kia, Wenke Weinreich, Mikko Utriainen, Riikka L. Puurunen, Nora Haufe

    Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

    Original languageEnglish
    Title of host publicationALD 2019 Technical Program & Abstracts
    PublisherAmerican Vacuum Society AVS
    Pages61-61
    Number of pages1
    Publication statusPublished - 22 Jul 2019
    MoE publication typeNot Eligible
    Event19th International Conference on Atomic Layer Deposition, ALD 2019 - Bellevue, Washington, United States
    Duration: 21 Jul 201924 Jul 2019
    https://ald2019.avs.org/

    Conference

    Conference19th International Conference on Atomic Layer Deposition, ALD 2019
    Abbreviated titleALD2019
    CountryUnited States
    CityWashington
    Period21/07/1924/07/19
    Internet address

    Cite this

    Kia, A. M., Weinreich, W., Utriainen, M., Puurunen, R. L., & Haufe, N. (2019). Dopant Concentration Analysis of ALD Thin Films in 3D Structures by ToF-SIMS. In ALD 2019 Technical Program & Abstracts (pp. 61-61). American Vacuum Society AVS.
    Kia, Alireza M. ; Weinreich, Wenke ; Utriainen, Mikko ; Puurunen, Riikka L. ; Haufe, Nora. / Dopant Concentration Analysis of ALD Thin Films in 3D Structures by ToF-SIMS. ALD 2019 Technical Program & Abstracts. American Vacuum Society AVS, 2019. pp. 61-61
    @inbook{182e62ebf999429bacb6a1401a5bd8a7,
    title = "Dopant Concentration Analysis of ALD Thin Films in 3D Structures by ToF-SIMS",
    author = "Kia, {Alireza M.} and Wenke Weinreich and Mikko Utriainen and Puurunen, {Riikka L.} and Nora Haufe",
    year = "2019",
    month = "7",
    day = "22",
    language = "English",
    pages = "61--61",
    booktitle = "ALD 2019 Technical Program & Abstracts",
    publisher = "American Vacuum Society AVS",
    address = "United States",

    }

    Kia, AM, Weinreich, W, Utriainen, M, Puurunen, RL & Haufe, N 2019, Dopant Concentration Analysis of ALD Thin Films in 3D Structures by ToF-SIMS. in ALD 2019 Technical Program & Abstracts. American Vacuum Society AVS, pp. 61-61, 19th International Conference on Atomic Layer Deposition, ALD 2019, Washington, United States, 21/07/19.

    Dopant Concentration Analysis of ALD Thin Films in 3D Structures by ToF-SIMS. / Kia, Alireza M.; Weinreich, Wenke; Utriainen, Mikko; Puurunen, Riikka L.; Haufe, Nora.

    ALD 2019 Technical Program & Abstracts. American Vacuum Society AVS, 2019. p. 61-61.

    Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

    TY - CHAP

    T1 - Dopant Concentration Analysis of ALD Thin Films in 3D Structures by ToF-SIMS

    AU - Kia, Alireza M.

    AU - Weinreich, Wenke

    AU - Utriainen, Mikko

    AU - Puurunen, Riikka L.

    AU - Haufe, Nora

    PY - 2019/7/22

    Y1 - 2019/7/22

    M3 - Conference abstract in proceedings

    SP - 61

    EP - 61

    BT - ALD 2019 Technical Program & Abstracts

    PB - American Vacuum Society AVS

    ER -

    Kia AM, Weinreich W, Utriainen M, Puurunen RL, Haufe N. Dopant Concentration Analysis of ALD Thin Films in 3D Structures by ToF-SIMS. In ALD 2019 Technical Program & Abstracts. American Vacuum Society AVS. 2019. p. 61-61