Dopant Concentration Analysis of ALD Thin Films in 3D Structures by ToF-SIMS

Alireza M. Kia, Wenke Weinreich, Mikko Utriainen, Riikka L. Puurunen, Nora Haufe

    Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

    Original languageEnglish
    Title of host publicationALD 2019 Technical Program & Abstracts
    PublisherAmerican Vacuum Society AVS
    Pages61-61
    Number of pages1
    Publication statusPublished - 22 Jul 2019
    MoE publication typeNot Eligible
    Event19th International Conference on Atomic Layer Deposition, ALD 2019 - Bellevue, Washington, United States
    Duration: 21 Jul 201924 Jul 2019
    https://ald2019.avs.org/

    Conference

    Conference19th International Conference on Atomic Layer Deposition, ALD 2019
    Abbreviated titleALD2019
    CountryUnited States
    CityWashington
    Period21/07/1924/07/19
    Internet address

    Cite this

    Kia, A. M., Weinreich, W., Utriainen, M., Puurunen, R. L., & Haufe, N. (2019). Dopant Concentration Analysis of ALD Thin Films in 3D Structures by ToF-SIMS. In ALD 2019 Technical Program & Abstracts (pp. 61-61). American Vacuum Society AVS.