Dopant Concentration Analysis of ALD Thin Films in 3D Structures by ToF-SIMS

Alireza M. Kia, Wenke Weinreich, Mikko Utriainen, Riikka L. Puurunen, Nora Haufe

Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

Original languageEnglish
Title of host publicationALD 2019 Technical Program & Abstracts
PublisherAmerican Vacuum Society AVS
Pages61-61
Number of pages1
Publication statusPublished - 22 Jul 2019
MoE publication typeNot Eligible
Event19th International Conference on Atomic Layer Deposition, ALD 2019 - Bellevue, Washington, United States
Duration: 21 Jul 201924 Jul 2019
https://ald2019.avs.org/

Conference

Conference19th International Conference on Atomic Layer Deposition, ALD 2019
Abbreviated titleALD2019
CountryUnited States
CityWashington
Period21/07/1924/07/19
Internet address

Keywords

  • OtaNano

Equipment

  • Cite this

    Kia, A. M., Weinreich, W., Utriainen, M., Puurunen, R. L., & Haufe, N. (2019). Dopant Concentration Analysis of ALD Thin Films in 3D Structures by ToF-SIMS. In ALD 2019 Technical Program & Abstracts (pp. 61-61). American Vacuum Society AVS. https://www.pathlms.com/avstechnicallibrary/events/1550/slide_presentations/138429