Dopant Concentration Analysis of ALD Thin Films in 3D Structures by ToF-SIMS

Alireza M. Kia; Wenke Weinreich; Mikko Utriainen; Riikka L. Puurunen; Nora Haufe

Dopant Concentration Analysis of ALD Thin Films in 3D Structures by ToF-SIMS

Alireza M. Kia
, Wenke Weinreich
, Mikko Utriainen
, Riikka L. Puurunen
, Nora Haufe

Fraunhofer Institute for Photonic Microsystems IPMS
VTT (former employee or external)
Aalto University

Research output: Chapter in Book/Report/Conference proceeding › Conference abstract in proceedings › Scientific

Original language	English
Title of host publication	ALD 2019 Technical Program & Abstracts
Publisher	American Vacuum Society (AVS)
Pages	61-61
Number of pages	1
Publication status	Published - 22 Jul 2019
MoE publication type	Not Eligible
Event	19th International Conference on Atomic Layer Deposition, ALD 2019 - Bellevue, Washington, United States Duration: 21 Jul 2019 → 24 Jul 2019 https://ald2019.avs.org/

Conference

Conference	19th International Conference on Atomic Layer Deposition, ALD 2019
Abbreviated title	ALD2019
Country/Territory	United States
City	Washington
Period	21/07/19 → 24/07/19
Internet address	https://ald2019.avs.org/

Keywords

OtaNano

Access to Document

https://www.pathlms.com/avstechnicallibrary/events/1550/slide_presentations/138429

OtaNano
VTT Technical Research Centre of Finland
Facility/equipment: Facility

Cite this

@inbook{182e62ebf999429bacb6a1401a5bd8a7,

title = "Dopant Concentration Analysis of ALD Thin Films in 3D Structures by ToF-SIMS",

keywords = "OtaNano",

author = "Kia, \{Alireza M.\} and Wenke Weinreich and Mikko Utriainen and Puurunen, \{Riikka L.\} and Nora Haufe",

year = "2019",

month = jul,

day = "22",

language = "English",

pages = "61--61",

booktitle = "ALD 2019 Technical Program \& Abstracts",

publisher = "American Vacuum Society (AVS)",

address = "United States",

note = "19th International Conference on Atomic Layer Deposition, ALD 2019, ALD2019 ; Conference date: 21-07-2019 Through 24-07-2019",

url = "https://ald2019.avs.org/",

}

Kia, AM, Weinreich, W, Utriainen, M, Puurunen, RL & Haufe, N 2019, Dopant Concentration Analysis of ALD Thin Films in 3D Structures by ToF-SIMS. in ALD 2019 Technical Program & Abstracts. American Vacuum Society (AVS), pp. 61-61, 19th International Conference on Atomic Layer Deposition, ALD 2019, Washington, Washington, United States, 21/07/19. <https://www.pathlms.com/avstechnicallibrary/events/1550/slide_presentations/138429>

TY - CHAP

T1 - Dopant Concentration Analysis of ALD Thin Films in 3D Structures by ToF-SIMS

AU - Kia, Alireza M.

AU - Weinreich, Wenke

AU - Utriainen, Mikko

AU - Puurunen, Riikka L.

AU - Haufe, Nora

PY - 2019/7/22

Y1 - 2019/7/22

KW - OtaNano

M3 - Conference abstract in proceedings

SP - 61

EP - 61

BT - ALD 2019 Technical Program & Abstracts

PB - American Vacuum Society (AVS)

T2 - 19th International Conference on Atomic Layer Deposition, ALD 2019

Y2 - 21 July 2019 through 24 July 2019

ER -

Dopant Concentration Analysis of ALD Thin Films in 3D Structures by ToF-SIMS

Conference

Keywords

Access to Document

Equipment

OtaNano

Cite this