Abstract
Optical rib waveguides with various widths and heights were fabricated
on silicon-on-insulator (SOI) substrates. Silicon etching was based on
dry etching with inductively coupled plasma (ICP)-type reactive ion
etcher. The etching process was developed to ensure low optical losses.
Propagation loss of 0.13/spl plusmn/0.02 dB/cm was measured for the
fundamental mode at the wavelength of 1550 nm in a curved 114-cm-long
waveguide. The reflection losses were suppressed by applying atomic
layer deposition (ALD) in the growth of antireflection coatings (ARCs).
Original language | English |
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Pages (from-to) | 3875-3880 |
Journal | Journal of Lightwave Technology |
Volume | 23 |
Issue number | 11 |
DOIs | |
Publication status | Published - 2005 |
MoE publication type | A1 Journal article-refereed |
Keywords
- atomic layer deposition (ALD)
- integrated optics
- optical device fabrication
- optical losses
- optical waveguides
- silicon-on-insulator (SOI) technology