Optical rib waveguides with various widths and heights were fabricated on silicon-on-insulator (SOI) substrates. Silicon etching was based on dry etching with inductively coupled plasma (ICP)-type reactive ion etcher. The etching process was developed to ensure low optical losses. Propagation loss of 0.13/spl plusmn/0.02 dB/cm was measured for the fundamental mode at the wavelength of 1550 nm in a curved 114-cm-long waveguide. The reflection losses were suppressed by applying atomic layer deposition (ALD) in the growth of antireflection coatings (ARCs).
- atomic layer deposition (ALD)
- integrated optics
- optical device fabrication
- optical losses
- optical waveguides
- silicon-on-insulator (SOI) technology
Solehmainen, K., Aalto, T., Dekker, J., Kapulainen, M., Harjanne, M., Kukli, K., Heimala, P., Kolari, K., & Leskelä, M. (2005). Dry-etched silicon-on-insulator waveguides with low propagation and fiber-coupling losses. Journal of Lightwave Technology, 23(11), 3875-3880. https://doi.org/10.1109/JLT.2005.857750