Abstract
Original language | English |
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Pages (from-to) | 3875-3880 |
Journal | Journal of Lightwave Technology |
Volume | 23 |
Issue number | 11 |
DOIs | |
Publication status | Published - 2005 |
MoE publication type | A1 Journal article-refereed |
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Keywords
- atomic layer deposition (ALD)
- integrated optics
- optical device fabrication
- optical losses
- optical waveguides
- silicon-on-insulator (SOI) technology
Cite this
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Dry-etched silicon-on-insulator waveguides with low propagation and fiber-coupling losses. / Solehmainen, Kimmo; Aalto, Timo; Dekker, James; Kapulainen, Markku; Harjanne, Mikko; Kukli, Kaupo; Heimala, Päivi; Kolari, Kai; Leskelä, Markku.
In: Journal of Lightwave Technology, Vol. 23, No. 11, 2005, p. 3875-3880.Research output: Contribution to journal › Article › Scientific › peer-review
TY - JOUR
T1 - Dry-etched silicon-on-insulator waveguides with low propagation and fiber-coupling losses
AU - Solehmainen, Kimmo
AU - Aalto, Timo
AU - Dekker, James
AU - Kapulainen, Markku
AU - Harjanne, Mikko
AU - Kukli, Kaupo
AU - Heimala, Päivi
AU - Kolari, Kai
AU - Leskelä, Markku
N1 - Project code: T4SU00310
PY - 2005
Y1 - 2005
N2 - Optical rib waveguides with various widths and heights were fabricated on silicon-on-insulator (SOI) substrates. Silicon etching was based on dry etching with inductively coupled plasma (ICP)-type reactive ion etcher. The etching process was developed to ensure low optical losses. Propagation loss of 0.13/spl plusmn/0.02 dB/cm was measured for the fundamental mode at the wavelength of 1550 nm in a curved 114-cm-long waveguide. The reflection losses were suppressed by applying atomic layer deposition (ALD) in the growth of antireflection coatings (ARCs).
AB - Optical rib waveguides with various widths and heights were fabricated on silicon-on-insulator (SOI) substrates. Silicon etching was based on dry etching with inductively coupled plasma (ICP)-type reactive ion etcher. The etching process was developed to ensure low optical losses. Propagation loss of 0.13/spl plusmn/0.02 dB/cm was measured for the fundamental mode at the wavelength of 1550 nm in a curved 114-cm-long waveguide. The reflection losses were suppressed by applying atomic layer deposition (ALD) in the growth of antireflection coatings (ARCs).
KW - atomic layer deposition (ALD)
KW - integrated optics
KW - optical device fabrication
KW - optical losses
KW - optical waveguides
KW - silicon-on-insulator (SOI) technology
U2 - 10.1109/JLT.2005.857750
DO - 10.1109/JLT.2005.857750
M3 - Article
VL - 23
SP - 3875
EP - 3880
JO - Journal of Lightwave Technology
JF - Journal of Lightwave Technology
SN - 0733-8724
IS - 11
ER -