Dry-etched silicon-on-insulator waveguides with low propagation and fiber-coupling losses

Kimmo Solehmainen, Timo Aalto, James Dekker, Markku Kapulainen, Mikko Harjanne, Kaupo Kukli, Päivi Heimala, Kai Kolari, Markku Leskelä

Research output: Contribution to journalArticleScientificpeer-review

31 Citations (Scopus)

Abstract

Optical rib waveguides with various widths and heights were fabricated on silicon-on-insulator (SOI) substrates. Silicon etching was based on dry etching with inductively coupled plasma (ICP)-type reactive ion etcher. The etching process was developed to ensure low optical losses. Propagation loss of 0.13/spl plusmn/0.02 dB/cm was measured for the fundamental mode at the wavelength of 1550 nm in a curved 114-cm-long waveguide. The reflection losses were suppressed by applying atomic layer deposition (ALD) in the growth of antireflection coatings (ARCs).
Original languageEnglish
Pages (from-to)3875-3880
JournalJournal of Lightwave Technology
Volume23
Issue number11
DOIs
Publication statusPublished - 2005
MoE publication typeA1 Journal article-refereed

Keywords

  • atomic layer deposition (ALD)
  • integrated optics
  • optical device fabrication
  • optical losses
  • optical waveguides
  • silicon-on-insulator (SOI) technology

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