Dry-etched silicon-on-insulator waveguides with low propagation and fiber-coupling losses

Kimmo Solehmainen, Timo Aalto, James Dekker, Markku Kapulainen, Mikko Harjanne, Kaupo Kukli, Päivi Heimala, Kai Kolari, Markku Leskelä

    Research output: Contribution to journalArticleScientificpeer-review

    35 Citations (Scopus)

    Abstract

    Optical rib waveguides with various widths and heights were fabricated on silicon-on-insulator (SOI) substrates. Silicon etching was based on dry etching with inductively coupled plasma (ICP)-type reactive ion etcher. The etching process was developed to ensure low optical losses. Propagation loss of 0.13/spl plusmn/0.02 dB/cm was measured for the fundamental mode at the wavelength of 1550 nm in a curved 114-cm-long waveguide. The reflection losses were suppressed by applying atomic layer deposition (ALD) in the growth of antireflection coatings (ARCs).
    Original languageEnglish
    Pages (from-to)3875-3880
    JournalJournal of Lightwave Technology
    Volume23
    Issue number11
    DOIs
    Publication statusPublished - 2005
    MoE publication typeA1 Journal article-refereed

    Keywords

    • atomic layer deposition (ALD)
    • integrated optics
    • optical device fabrication
    • optical losses
    • optical waveguides
    • silicon-on-insulator (SOI) technology

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