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Effect of atomic layer annealing in plasma-enhanced atomic layer deposition of aluminum nitride on silicon

  • Heli Seppänen*
  • , Igor Prozheev
  • , Christoffer Kauppinen
  • , Sami Suihkonen
  • , Kenichiro Mizohata
  • , Harri Lipsanen
    • *Corresponding author for this work
  • Aalto University
  • University of Helsinki

Research output: Contribution to journal › Article › Scientific › peer-review

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