Effect of ozone concentration on silicon surface passivation by atomic layer deposited Al2O3

Guillaume von Gastrow*, Shuo Li, Matti Putkonen, Mikko Laitinen, Timo Sajavaara, Hele Savin

*Corresponding author for this work

    Research output: Contribution to journalArticleScientificpeer-review

    22 Citations (Scopus)

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    Material Science

    Engineering

    Chemical Engineering