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Effect of precursor chemistry on residual stress of ALD Al2O3 and TiO2 films

  • Ville Miikkulainen*
  • , Heta Nieminen
  • , Oili Ylivaara
  • , Kenichiro Mizohata
  • , Riikka L. Puurunen
  • , Mikko Ritala
    • *Corresponding author for this work
    • University of Helsinki

    Research output: Chapter in Book/Report/Conference proceeding › Conference abstract in proceedings › Scientific

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