Effect of precursor chemistry on residual stress of ALD Al2O3 and TiO2 films

Ville Miikkulainen (Corresponding author), Heta Nieminen, Oili Ylivaara, Kenichiro Mizohata, Riikka L. Puurunen, Mikko Ritala

    Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

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