Effect of surfactants on particle contamination of silicon surface in HF solutions

Tapani Vehmas, Heini Ritala, Oili Anttila

    Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

    Original languageEnglish
    Title of host publicationCleaning Technology in Semiconductor Device Manufacturing VIII
    Subtitle of host publicationProceedings of the International Symposium
    EditorsJ. Ruzyllo, T. Hattori, R. L. Opila, R. E. Novak
    PublisherElectrochemical Society ECS
    Pages195-202
    ISBN (Print)1-56677-411-X
    Publication statusPublished - 2004
    MoE publication typeA4 Article in a conference publication
    Event8th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing: Part of the 204th ECS Meeting - Orlando, United States
    Duration: 12 Oct 200316 Oct 2003

    Publication series

    SeriesECS Proceedings Volumes
    Volume2003-26
    ISSN2576-1579

    Conference

    Conference8th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
    CountryUnited States
    CityOrlando
    Period12/10/0316/10/03

    Cite this

    Vehmas, T., Ritala, H., & Anttila, O. (2004). Effect of surfactants on particle contamination of silicon surface in HF solutions. In J. Ruzyllo, T. Hattori, R. L. Opila, & R. E. Novak (Eds.), Cleaning Technology in Semiconductor Device Manufacturing VIII: Proceedings of the International Symposium (pp. 195-202). Electrochemical Society ECS. ECS Proceedings Volumes, Vol.. 2003-26