Electrical properties of atomic layer deposited (ALD) TiO2 films

Jaakko Saarilahti, Hannu Kattelus, Hannu Luoto

Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

Original languageEnglish
Title of host publicationMAM-2006
Subtitle of host publicationBook of Abstracts
Pages258-259
Publication statusPublished - 2006
EventMAM-2006: Materials for Advanced Metallization - Grenoble, Switzerland
Duration: 6 Mar 20068 Mar 2006

Conference

ConferenceMAM-2006: Materials for Advanced Metallization
CountrySwitzerland
CityGrenoble
Period6/03/068/03/06

Cite this

Saarilahti, J., Kattelus, H., & Luoto, H. (2006). Electrical properties of atomic layer deposited (ALD) TiO2 films. In MAM-2006: Book of Abstracts (pp. 258-259)