Electron Probe Microanalysis of HfO2 Thin Films on Conductive and Insulating Substrates

Marina Lulla, Jelena Asari, Jaan Aarik, Kaupo Kukli, Raul Rammula, Unto Tapper, Esko I. Kauppinen, Väinö Sammelselg (Corresponding Author)

Research output: Contribution to journalArticleScientificpeer-review

4 Citations (Scopus)

Abstract

Quantitative electron probe microanalysis of highly insulating materials is a complicated problem, partially solved by coating samples with grounded thin conductive layers or using novel scanning electron microscopy (SEM) techniques, such as low-voltage and/or variable pressure SEM. In this work, some problems of quantitative X-ray microanalysis of thin HfO2 films, in particular the possibility to determine mass thickness correlated to the density of the layer material, are discussed. For comparison, Al2O3, Ta2O5 and TiO2 films grown onto both semiconductive Si and insulating quartz substrates were also analysed. All the films studied were synthesized by atomic layer deposition method.
Original languageEnglish
Pages (from-to)195-198
Number of pages4
JournalMikrochimica Acta
Volume155
Issue number1-2
DOIs
Publication statusPublished - 2006
MoE publication typeA1 Journal article-refereed

Fingerprint

Electron probe microanalysis
Thin films
Scanning electron microscopy
Quartz
Atomic layer deposition
Insulating materials
Substrates
X rays
Coatings
Electric potential

Keywords

  • X-ray microanalysis
  • hafnium oxide
  • high-k oxides
  • thin films
  • mass thickness

Cite this

Lulla, M., Asari, J., Aarik, J., Kukli, K., Rammula, R., Tapper, U., ... Sammelselg, V. (2006). Electron Probe Microanalysis of HfO2 Thin Films on Conductive and Insulating Substrates. Mikrochimica Acta, 155(1-2), 195-198. https://doi.org/10.1007/s00604-006-0542-9
Lulla, Marina ; Asari, Jelena ; Aarik, Jaan ; Kukli, Kaupo ; Rammula, Raul ; Tapper, Unto ; Kauppinen, Esko I. ; Sammelselg, Väinö. / Electron Probe Microanalysis of HfO2 Thin Films on Conductive and Insulating Substrates. In: Mikrochimica Acta. 2006 ; Vol. 155, No. 1-2. pp. 195-198.
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Lulla, M, Asari, J, Aarik, J, Kukli, K, Rammula, R, Tapper, U, Kauppinen, EI & Sammelselg, V 2006, 'Electron Probe Microanalysis of HfO2 Thin Films on Conductive and Insulating Substrates', Mikrochimica Acta, vol. 155, no. 1-2, pp. 195-198. https://doi.org/10.1007/s00604-006-0542-9

Electron Probe Microanalysis of HfO2 Thin Films on Conductive and Insulating Substrates. / Lulla, Marina; Asari, Jelena; Aarik, Jaan; Kukli, Kaupo; Rammula, Raul; Tapper, Unto; Kauppinen, Esko I.; Sammelselg, Väinö (Corresponding Author).

In: Mikrochimica Acta, Vol. 155, No. 1-2, 2006, p. 195-198.

Research output: Contribution to journalArticleScientificpeer-review

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T1 - Electron Probe Microanalysis of HfO2 Thin Films on Conductive and Insulating Substrates

AU - Lulla, Marina

AU - Asari, Jelena

AU - Aarik, Jaan

AU - Kukli, Kaupo

AU - Rammula, Raul

AU - Tapper, Unto

AU - Kauppinen, Esko I.

AU - Sammelselg, Väinö

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KW - X-ray microanalysis

KW - hafnium oxide

KW - high-k oxides

KW - thin films

KW - mass thickness

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