Electron radiation sensitive hybrid sol-gel materials for electron-beam lithography and diffractive optics

Juha Rantala, R. Scott Penner, Seppo Honkanen, Nina Nordman, Olli Nordman, Jouko Vähäkangas, Mahmoud Fallahi, Nasser Peyghambarian

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

4 Citations (Scopus)

Abstract

We present two techniques to use hybrid sol-gel materials for electron-beam lithography and direct writing of surface relief diffractive elements. We are able to obtain direct physical electron beam etching of hybrid sol-gel glass and variable- doses can induce complex multi-phase-level diffractive elements and apodized sol-gel waveguide gratings. We are also able to obtain hybrid so-gel glass formation under the electron radiation, so that material can be used as a negative resist in electron-beam lithography. Both of these techniques are promising for the fabrication of submicron optical components and micromachining tools such as embossing masters for the replication.
Original languageEnglish
Title of host publicationOrganic-Inorganic Hybrid Materials for Photonics
EditorsLiliane G. Hubert-Pfalzgraf, S. Iraj Najafi
Place of PublicationBellingham
PublisherInternational Society for Optics and Photonics SPIE
Pages30-37
ISBN (Print)978-0-8194-2924-7
DOIs
Publication statusPublished - 1998
MoE publication typeA4 Article in a conference publication
EventOrganic-Inorganic Hybrid Materials for Photonics - San Diego, United States
Duration: 19 Jul 199820 Jul 1998

Publication series

SeriesProceedings of SPIE
Volume3469
ISSN0277-786X

Conference

ConferenceOrganic-Inorganic Hybrid Materials for Photonics
Country/TerritoryUnited States
CitySan Diego
Period19/07/9820/07/98

Keywords

  • hybrid sol-gel
  • electron beam writing
  • diffractive elements
  • integrated optics
  • sol-gel resist

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