@inproceedings{aa62a5f9c5414984a58e16aa929add10,
title = "Electron radiation sensitive hybrid sol-gel materials for electron-beam lithography and diffractive optics",
abstract = "We present two techniques to use hybrid sol-gel materials for electron-beam lithography and direct writing of surface relief diffractive elements. We are able to obtain direct physical electron beam etching of hybrid sol-gel glass and variable- doses can induce complex multi-phase-level diffractive elements and apodized sol-gel waveguide gratings. We are also able to obtain hybrid so-gel glass formation under the electron radiation, so that material can be used as a negative resist in electron-beam lithography. Both of these techniques are promising for the fabrication of submicron optical components and micromachining tools such as embossing masters for the replication.",
keywords = "hybrid sol-gel, electron beam writing, diffractive elements, integrated optics, sol-gel resist",
author = "Juha Rantala and Penner, {R. Scott} and Seppo Honkanen and Nina Nordman and Olli Nordman and Jouko V{\"a}h{\"a}kangas and Mahmoud Fallahi and Nasser Peyghambarian",
year = "1998",
doi = "10.1117/12.312923",
language = "English",
isbn = "978-0-8194-2924-7",
series = "Proceedings of SPIE",
publisher = "International Society for Optics and Photonics SPIE",
pages = "30--37",
editor = "Hubert-Pfalzgraf, {Liliane G.} and Najafi, {S. Iraj}",
booktitle = "Organic-Inorganic Hybrid Materials for Photonics",
address = "United States",
note = "Organic-Inorganic Hybrid Materials for Photonics ; Conference date: 19-07-1998 Through 20-07-1998",
}