Electron radiation sensitive hybrid sol-gel materials for electron-beam lithography and diffractive optics

Juha Rantala; R. Scott Penner; Seppo Honkanen; Nina Nordman; Olli Nordman; Jouko Vähäkangas; Mahmoud Fallahi; Nasser Peyghambarian

doi:10.1117/12.312923

Electron radiation sensitive hybrid sol-gel materials for electron-beam lithography and diffractive optics

Juha Rantala
, R. Scott Penner
, Seppo Honkanen
, Nina Nordman
, Olli Nordman
, Jouko Vähäkangas
, Mahmoud Fallahi
, Nasser Peyghambarian

VTT Technical Research Centre of Finland

University of Arizona
VTT (former employee or external)

Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review

4 Citations (Scopus)

Abstract

We present two techniques to use hybrid sol-gel materials for electron-beam lithography and direct writing of surface relief diffractive elements. We are able to obtain direct physical electron beam etching of hybrid sol-gel glass and variable- doses can induce complex multi-phase-level diffractive elements and apodized sol-gel waveguide gratings. We are also able to obtain hybrid so-gel glass formation under the electron radiation, so that material can be used as a negative resist in electron-beam lithography. Both of these techniques are promising for the fabrication of submicron optical components and micromachining tools such as embossing masters for the replication.

Original language	English
Title of host publication	Organic-Inorganic Hybrid Materials for Photonics
Editors	Liliane G. Hubert-Pfalzgraf, S. Iraj Najafi
Place of Publication	Bellingham
Publisher	International Society for Optics and Photonics SPIE
Pages	30-37
ISBN (Print)	978-0-8194-2924-7
DOIs	https://doi.org/10.1117/12.312923
Publication status	Published - 1998
MoE publication type	A4 Article in a conference publication
Event	Organic-Inorganic Hybrid Materials for Photonics - San Diego, United States Duration: 19 Jul 1998 → 20 Jul 1998

Publication series

Series	Proceedings of SPIE
Volume	3469
ISSN	0277-786X

Conference

Conference	Organic-Inorganic Hybrid Materials for Photonics
Country/Territory	United States
City	San Diego
Period	19/07/98 → 20/07/98

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

SDG 9 Industry, Innovation, and Infrastructure

Keywords

hybrid sol-gel
electron beam writing
diffractive elements
integrated optics
sol-gel resist

Access to Document

10.1117/12.312923

Cite this

Rantala, J., Penner, R. S., Honkanen, S., Nordman, N., Nordman, O., Vähäkangas, J., Fallahi, M., & Peyghambarian, N. (1998). Electron radiation sensitive hybrid sol-gel materials for electron-beam lithography and diffractive optics. In L. G. Hubert-Pfalzgraf, & S. I. Najafi (Eds.), Organic-Inorganic Hybrid Materials for Photonics (pp. 30-37). International Society for Optics and Photonics SPIE. https://doi.org/10.1117/12.312923

Rantala, Juha ; Penner, R. Scott ; Honkanen, Seppo et al. / Electron radiation sensitive hybrid sol-gel materials for electron-beam lithography and diffractive optics. Organic-Inorganic Hybrid Materials for Photonics. editor / Liliane G. Hubert-Pfalzgraf ; S. Iraj Najafi. Bellingham : International Society for Optics and Photonics SPIE, 1998. pp. 30-37 (Proceedings of SPIE, Vol. 3469).

@inproceedings{aa62a5f9c5414984a58e16aa929add10,

title = "Electron radiation sensitive hybrid sol-gel materials for electron-beam lithography and diffractive optics",

abstract = "We present two techniques to use hybrid sol-gel materials for electron-beam lithography and direct writing of surface relief diffractive elements. We are able to obtain direct physical electron beam etching of hybrid sol-gel glass and variable- doses can induce complex multi-phase-level diffractive elements and apodized sol-gel waveguide gratings. We are also able to obtain hybrid so-gel glass formation under the electron radiation, so that material can be used as a negative resist in electron-beam lithography. Both of these techniques are promising for the fabrication of submicron optical components and micromachining tools such as embossing masters for the replication.",

keywords = "hybrid sol-gel, electron beam writing, diffractive elements, integrated optics, sol-gel resist",

author = "Juha Rantala and Penner, \{R. Scott\} and Seppo Honkanen and Nina Nordman and Olli Nordman and Jouko V{\"a}h{\"a}kangas and Mahmoud Fallahi and Nasser Peyghambarian",

year = "1998",

doi = "10.1117/12.312923",

language = "English",

isbn = "978-0-8194-2924-7",

series = "Proceedings of SPIE",

publisher = "International Society for Optics and Photonics SPIE",

pages = "30--37",

editor = "Hubert-Pfalzgraf, \{Liliane G.\} and Najafi, \{S. Iraj\}",

booktitle = "Organic-Inorganic Hybrid Materials for Photonics",

address = "United States",

note = "Organic-Inorganic Hybrid Materials for Photonics ; Conference date: 19-07-1998 Through 20-07-1998",

}

Rantala, J, Penner, RS, Honkanen, S, Nordman, N, Nordman, O, Vähäkangas, J, Fallahi, M & Peyghambarian, N 1998, Electron radiation sensitive hybrid sol-gel materials for electron-beam lithography and diffractive optics. in LG Hubert-Pfalzgraf & SI Najafi (eds), Organic-Inorganic Hybrid Materials for Photonics. International Society for Optics and Photonics SPIE, Bellingham, Proceedings of SPIE, vol. 3469, pp. 30-37, Organic-Inorganic Hybrid Materials for Photonics, San Diego, California, United States, 19/07/98. https://doi.org/10.1117/12.312923

Electron radiation sensitive hybrid sol-gel materials for electron-beam lithography and diffractive optics. / Rantala, Juha; Penner, R. Scott; Honkanen, Seppo et al.
Organic-Inorganic Hybrid Materials for Photonics. ed. / Liliane G. Hubert-Pfalzgraf; S. Iraj Najafi. Bellingham: International Society for Optics and Photonics SPIE, 1998. p. 30-37 (Proceedings of SPIE, Vol. 3469).

Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review

TY - GEN

T1 - Electron radiation sensitive hybrid sol-gel materials for electron-beam lithography and diffractive optics

AU - Rantala, Juha

AU - Penner, R. Scott

AU - Honkanen, Seppo

AU - Nordman, Nina

AU - Nordman, Olli

AU - Vähäkangas, Jouko

AU - Fallahi, Mahmoud

AU - Peyghambarian, Nasser

PY - 1998

Y1 - 1998

N2 - We present two techniques to use hybrid sol-gel materials for electron-beam lithography and direct writing of surface relief diffractive elements. We are able to obtain direct physical electron beam etching of hybrid sol-gel glass and variable- doses can induce complex multi-phase-level diffractive elements and apodized sol-gel waveguide gratings. We are also able to obtain hybrid so-gel glass formation under the electron radiation, so that material can be used as a negative resist in electron-beam lithography. Both of these techniques are promising for the fabrication of submicron optical components and micromachining tools such as embossing masters for the replication.

AB - We present two techniques to use hybrid sol-gel materials for electron-beam lithography and direct writing of surface relief diffractive elements. We are able to obtain direct physical electron beam etching of hybrid sol-gel glass and variable- doses can induce complex multi-phase-level diffractive elements and apodized sol-gel waveguide gratings. We are also able to obtain hybrid so-gel glass formation under the electron radiation, so that material can be used as a negative resist in electron-beam lithography. Both of these techniques are promising for the fabrication of submicron optical components and micromachining tools such as embossing masters for the replication.

KW - hybrid sol-gel

KW - electron beam writing

KW - diffractive elements

KW - integrated optics

KW - sol-gel resist

U2 - 10.1117/12.312923

DO - 10.1117/12.312923

M3 - Conference article in proceedings

SN - 978-0-8194-2924-7

T3 - Proceedings of SPIE

SP - 30

EP - 37

BT - Organic-Inorganic Hybrid Materials for Photonics

A2 - Hubert-Pfalzgraf, Liliane G.

A2 - Najafi, S. Iraj

PB - International Society for Optics and Photonics SPIE

CY - Bellingham

T2 - Organic-Inorganic Hybrid Materials for Photonics

Y2 - 19 July 1998 through 20 July 1998

ER -

Rantala J, Penner RS, Honkanen S, Nordman N, Nordman O, Vähäkangas J et al. Electron radiation sensitive hybrid sol-gel materials for electron-beam lithography and diffractive optics. In Hubert-Pfalzgraf LG, Najafi SI, editors, Organic-Inorganic Hybrid Materials for Photonics. Bellingham: International Society for Optics and Photonics SPIE. 1998. p. 30-37. (Proceedings of SPIE, Vol. 3469). doi: 10.1117/12.312923

Electron radiation sensitive hybrid sol-gel materials for electron-beam lithography and diffractive optics

Abstract

Publication series

Conference

UN SDGs

Keywords

Access to Document

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