Emerging nanopatterning methods

Jouni Ahopelto

Emerging nanopatterning methods

Research output: Chapter in Book/Report/Conference proceeding › Conference abstract in proceedings › Scientific

Abstract

The emerging nanopatterning methods (NaPa) consortium integrates new patterning methods into one project, both anticipating and responding to the increasing need for nanopatterning technologies, standards and metrology required to harness the new application-relevant properties of engineered structures with nm-scale features. To achieve this, research in three technology strands is carried out. The technologies are nanoimprint lithography, soft lithography & self-assembly and MEMS-based nanopatterning.

Original language	English
Title of host publication	2007 Digest of papers Microprocesses and Nanotechnology
Publisher	IEEE Institute of Electrical and Electronic Engineers
Pages	402
Number of pages	1
ISBN (Print)	4-9902472-4-8
Publication status	Published - 2007
MoE publication type	Not Eligible
Event	20th International Microprocesses and Nanotechnology Conference, MNC 2007 - Kyoto, Japan Duration: 5 Nov 2007 → 8 Nov 2007

Conference

Conference	20th International Microprocesses and Nanotechnology Conference, MNC 2007
Country/Territory	Japan
City	Kyoto
Period	5/11/07 → 8/11/07

Cite this

@inbook{2b3584d934fd49d0a2d2efa2096f5f0e,

title = "Emerging nanopatterning methods",

abstract = "The emerging nanopatterning methods (NaPa) consortium integrates new patterning methods into one project, both anticipating and responding to the increasing need for nanopatterning technologies, standards and metrology required to harness the new application-relevant properties of engineered structures with nm-scale features. To achieve this, research in three technology strands is carried out. The technologies are nanoimprint lithography, soft lithography & self-assembly and MEMS-based nanopatterning.",

author = "Jouni Ahopelto",

year = "2007",

language = "English",

isbn = "4-9902472-4-8",

pages = "402",

booktitle = "2007 Digest of papers Microprocesses and Nanotechnology",

publisher = "IEEE Institute of Electrical and Electronic Engineers",

address = "United States",

note = "20th International Microprocesses and Nanotechnology Conference, MNC 2007 ; Conference date: 05-11-2007 Through 08-11-2007",

}

TY - CHAP

T1 - Emerging nanopatterning methods

AU - Ahopelto, Jouni

PY - 2007

Y1 - 2007

N2 - The emerging nanopatterning methods (NaPa) consortium integrates new patterning methods into one project, both anticipating and responding to the increasing need for nanopatterning technologies, standards and metrology required to harness the new application-relevant properties of engineered structures with nm-scale features. To achieve this, research in three technology strands is carried out. The technologies are nanoimprint lithography, soft lithography & self-assembly and MEMS-based nanopatterning.

AB - The emerging nanopatterning methods (NaPa) consortium integrates new patterning methods into one project, both anticipating and responding to the increasing need for nanopatterning technologies, standards and metrology required to harness the new application-relevant properties of engineered structures with nm-scale features. To achieve this, research in three technology strands is carried out. The technologies are nanoimprint lithography, soft lithography & self-assembly and MEMS-based nanopatterning.

M3 - Conference abstract in proceedings

SN - 4-9902472-4-8

SP - 402

BT - 2007 Digest of papers Microprocesses and Nanotechnology

PB - IEEE Institute of Electrical and Electronic Engineers

T2 - 20th International Microprocesses and Nanotechnology Conference, MNC 2007

Y2 - 5 November 2007 through 8 November 2007

ER -

Emerging nanopatterning methods

Abstract

Conference

Fingerprint

Cite this