Emerging nanopatterning methods

    Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific


    The emerging nanopatterning methods (NaPa) consortium integrates new patterning methods into one project, both anticipating and responding to the increasing need for nanopatterning technologies, standards and metrology required to harness the new application-relevant properties of engineered structures with nm-scale features. To achieve this, research in three technology strands is carried out. The technologies are nanoimprint lithography, soft lithography & self-assembly and MEMS-based nanopatterning.
    Original languageEnglish
    Title of host publication2007 Digest of papers Microprocesses and Nanotechnology
    PublisherIEEE Institute of Electrical and Electronic Engineers
    Number of pages1
    ISBN (Print)4-9902472-4-8
    Publication statusPublished - 2007
    MoE publication typeNot Eligible
    Event20th International Microprocesses and Nanotechnology Conference, MNC 2007 - Kyoto, Japan
    Duration: 5 Nov 20078 Nov 2007


    Conference20th International Microprocesses and Nanotechnology Conference, MNC 2007


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